DOI: 10.1143/jjap.31.l585. Preparation of (111)-Oriented β-Ta<sub>2</sub>O<sub>5</sub> Thin Films by Chemical Vapor Deposition Using Metalorganic Precursors

Preparation of (111)-Oriented β-Ta2O5 Thin Films by Chemical Vapor Deposition Using Metalorganic Precursors

10.1143/jjap.31.l585

Crossref journal-article

IOP Publishing

Japanese Journal of Applied Physics (266)

Abstract

Tantalum pentaoxide thin films with orthorhombic structure have been grown on quartz and Si(100) substrates at 600∼700°C under reduced pressure of 5 Torr by metalorganic chemical vapor deposition. Ta(OC2H5)5 and Ta(DPM)4Cl were used as the source materials, and were compared with each other with respect to deposition behavior, crystal structure and orientation of Ta2O5 films. When the Ta(DPM)4Cl precursor was used, fine (111)-oriented Ta2O5 films were obtained on quartz and Si(100) substrates in a temperature range of 625∼675°C.

Bibliography

Tominaga, K., Muhammet, R., Kobayashi, I., & Masaru Okada, M. O. (1992). Preparation of (111)-Oriented Î²-Ta2O5 Thin Films by Chemical Vapor Deposition Using Metalorganic Precursors. Japanese Journal of Applied Physics, 31(5A), L585.

Authors 4

Koji Tominaga (first)
Rusul Muhammet (additional)
Ichizo Kobayashi (additional)
Masaru Okada Masaru Okada (additional)

References 10 Referenced 31

10.1149/1.2100469 / J. Electrochem. Soc. (1987)
10.5796/kogyobutsurikagaku.53.109 / Denki Kagaku (1985)
10.1143/JJAP.30.L330 / Jpn. J. Appl. Phys. (1991)
10.1364/AO.14.002194 / Appl. Opt. (1975)
{'key': '', 'first-page': '69', 'volume': '54', 'year': '1985', 'journal-title': 'Oyo Buturi'} / Oyo Buturi (1985)
10.1143/JJAP.28.1030 / Jpn. J. Appl. Phys. (1989)
10.1143/JJAP.29.718 / Jpn. J. Appl. Phys. (1990)
10.1063/1.347397 / J. Appl. Phys. (1991)
10.1063/1.348498 / J. Appl. Phys. (1991)
10.1143/JJAP.6.21 / Jpn. J. Appl. Phys. (1967)

Dates

Type	When
Created	20 years, 6 months ago (Feb. 22, 2005, 9:07 p.m.)
Deposited	2 years, 8 months ago (Dec. 6, 2022, 5:47 p.m.)
Indexed	2 months ago (June 24, 2025, 7:28 a.m.)
Issued	33 years, 3 months ago (May 1, 1992)
Published	33 years, 3 months ago (May 1, 1992)
Published Print	33 years, 3 months ago (May 1, 1992)

Funders 0

None

BibTeX

@article{Tominaga_1992, title={Preparation of (111)-Oriented β-Ta2O5 Thin Films by Chemical Vapor Deposition Using Metalorganic Precursors}, volume={31}, ISSN={1347-4065}, url={http://dx.doi.org/10.1143/jjap.31.l585}, DOI={10.1143/jjap.31.l585}, number={5A}, journal={Japanese Journal of Applied Physics}, publisher={IOP Publishing}, author={Tominaga, Koji and Muhammet, Rusul and Kobayashi, Ichizo and Masaru Okada, Masaru Okada}, year={1992}, month=may, pages={L585} }

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