DOI: 10.1143/jjap.30.1091. Preparation of MgO Thin Films by RF Magnetron Sputtering

Preparation of MgO Thin Films by RF Magnetron Sputtering

10.1143/jjap.30.1091

Crossref journal-article

IOP Publishing

Japanese Journal of Applied Physics (266)

Abstract

MgO thin films were prepared on Si(100) substrates by RF magnetron sputtering using a Mg, or MgO target. The preferred orientation of MgO thin films using a Mg target was transformed from a (200) plane to a (111) plane as a function of substrate temperature. The preferred orientation of MgO thin films using a MgO target was observed only in the (200) plane.

Authors 3

Yasuhisa Kaneko (first)
Nobuo Mikoshiba (additional)
Tsutomu Yamashita Tsutomu Yamashita (additional)

References 4 Referenced 24

10.1143/JJAP.27.L1524 / Jpn. J. Appl. Phys. (1988)
10.1063/1.325932 / J. Appl. Phys. (1979)
10.1116/1.1492638 / J. Vac. Sci. & Technol. (1968)
10.1063/1.324102 / J. Appl. Phys. (1977)

Dates

Type	When
Created	20 years, 6 months ago (Feb. 22, 2005, 8:54 p.m.)
Deposited	2 years, 8 months ago (Dec. 6, 2022, 6:10 p.m.)
Indexed	1 month, 3 weeks ago (July 7, 2025, 9:06 a.m.)
Issued	34 years, 3 months ago (May 1, 1991)
Published	34 years, 3 months ago (May 1, 1991)
Published Print	34 years, 3 months ago (May 1, 1991)

Funders 0

None

BibTeX

@article{Kaneko_1991, title={Preparation of MgO Thin Films by RF Magnetron Sputtering}, volume={30}, ISSN={1347-4065}, url={http://dx.doi.org/10.1143/jjap.30.1091}, DOI={10.1143/jjap.30.1091}, number={5R}, journal={Japanese Journal of Applied Physics}, publisher={IOP Publishing}, author={Kaneko, Yasuhisa and Mikoshiba, Nobuo and Tsutomu Yamashita, Tsutomu Yamashita}, year={1991}, month=may, pages={1091} }

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