DOI: 10.1143/jjap.29.34. Epitaxial Growth of High Quality Diamond Film by the Microwave Plasma-Assisted Chemical-Vapor-Deposition Method

Epitaxial Growth of High Quality Diamond Film by the Microwave Plasma-Assisted Chemical-Vapor-Deposition Method

10.1143/jjap.29.34

Crossref journal-article

IOP Publishing

Japanese Journal of Applied Physics (266)

Abstract

High-quality diamond epitaxial films were obtained on Ib diamond (100) substrates by means of the microwave plasma-assisted chemical-vapor-deposition (CVD) method. For the source gas, CH4 and H2 gases were used in different CH4 concentrations (CH4/H2), from 1 vol% to 8 vol%. At CH4/H2=6%, the surfaces of the films were smooth and streaks were observed by reflection high-energy electron diffraction (RHEED). Raman spectra showed that they had no graphitic components. In contrast, Raman spectra showed that both the (110) epitaxial films and the polycrystalline films grown at CH4=6% had graphitic components.

Bibliography

Shiomi, H., Tanabe, K., Nishibayashi, Y., & Fujimori, N. (1990). Epitaxial Growth of High Quality Diamond Film by the Microwave Plasma-Assisted Chemical-Vapor-Deposition Method. Japanese Journal of Applied Physics, 29(1R), 34.

Authors 4

Hiromu Shiomi (first)
Keiichirou Tanabe (additional)
Yoshiki Nishibayashi (additional)
Naoji Fujimori (additional)

References 16 Referenced 78

{'key': '', 'first-page': '720', 'volume': '16', 'year': '1982', 'journal-title': 'Sov. Phys.-Semicond.'} / Sov. Phys.-Semicond. (1982)
{'key': '', 'first-page': '146', 'volume': '17', 'year': '1983', 'journal-title': 'Sov. Phys.-Semicond.'} / Sov. Phys.-Semicond. (1983)
{'key': '', 'first-page': '829', 'volume': '19', 'year': '1985', 'journal-title': 'Sov. Phys.-Semicond.'} / Sov. Phys.-Semicond. (1985)
10.1016/0038-1098(79)90645-8 / Solid State Commun. (1979)
{'year': '1970', 'key': ''} (1970)
10.1109/EDL.1987.26653 / IEEE Electron Device Lett. (1987)
10.1063/1.1841272 / J. Chem. Phys. (1967)
10.1016/0042-207X(86)90279-4 / Vacuum (1986)
10.1143/JJAP.28.758 / Jpn. J. Appl. Phys. (1989)
10.1016/0378-4363(81)90274-6 / Physica B+C. (1981)
10.1103/PhysRevB.1.1687 / Phys. Rev. (1970)
10.1103/PhysRevB.29.3482 / Phys. Rev. B (1984)
10.1366/0003702864509295 / Appl. Spectros. (1986)
10.1063/1.1674108 / J. Chem. Phys. (1970)
10.1295/polymj.4.460 / Polym. J. (1973)
10.1103/PhysRevB.38.4067 / Phys. Rev. B (1988)

Dates

Type	When
Created	20 years, 6 months ago (Feb. 27, 2005, 10:05 p.m.)
Deposited	2 years, 9 months ago (Dec. 6, 2022, 8:10 a.m.)
Indexed	2 months, 3 weeks ago (June 16, 2025, 8:08 a.m.)
Issued	35 years, 8 months ago (Jan. 1, 1990)
Published	35 years, 8 months ago (Jan. 1, 1990)
Published Print	35 years, 8 months ago (Jan. 1, 1990)

Funders 0

None

BibTeX

@article{Shiomi_1990, title={Epitaxial Growth of High Quality Diamond Film by the Microwave Plasma-Assisted Chemical-Vapor-Deposition Method}, volume={29}, ISSN={1347-4065}, url={http://dx.doi.org/10.1143/jjap.29.34}, DOI={10.1143/jjap.29.34}, number={1R}, journal={Japanese Journal of Applied Physics}, publisher={IOP Publishing}, author={Shiomi, Hiromu and Tanabe, Keiichirou and Nishibayashi, Yoshiki and Fujimori, Naoji}, year={1990}, month=jan, pages={34} }

JSON

{
  "indexed": {
    "date-parts": [
      [
        2025,
        6,
        16
      ]
    ],
    "date-time": "2025-06-16T12:08:27Z",
    "timestamp": 1750075707106,
    "version": "3.37.3"
  },
  "reference-count": 16,
  "publisher": "IOP Publishing",
  "issue": "1R",
  "license": [
    {
      "start": {
        "date-parts": [
          [
            1990,
            1,
            1
          ]
        ],
        "date-time": "1990-01-01T00:00:00Z",
        "timestamp": 631152000000
      },
      "content-version": "vor",
      "delay-in-days": 0,
      "URL": "https://iopscience.iop.org/page/copyright"
    },
    {
      "start": {
        "date-parts": [
          [
            1990,
            1,
            1
          ]
        ],
        "date-time": "1990-01-01T00:00:00Z",
        "timestamp": 631152000000
      },
      "content-version": "tdm",
      "delay-in-days": 0,
      "URL": "https://iopscience.iop.org/info/page/text-and-data-mining"
    }
  ],
  "content-domain": {
    "domain": [
      "iopscience.iop.org"
    ],
    "crossmark-restriction": false
  },
  "published-print": {
    "date-parts": [
      [
        1990,
        1,
        1
      ]
    ]
  },
  "abstract": "<jats:p> \n High-quality diamond epitaxial films were obtained on Ib diamond (100) substrates by means of the microwave plasma-assisted chemical-vapor-deposition (CVD) method. For the source gas, CH<jats:sub>4</jats:sub> and H<jats:sub>2</jats:sub> gases were used in different CH<jats:sub>4</jats:sub> concentrations (CH<jats:sub>4</jats:sub>/H<jats:sub>2</jats:sub>), from 1 vol% to 8 vol%. At CH<jats:sub>4</jats:sub>/H<jats:sub>2</jats:sub>=6%, the surfaces of the films were smooth and streaks were observed by reflection high-energy electron diffraction (RHEED). Raman spectra showed that they had no graphitic components. In contrast, Raman spectra showed that both the (110) epitaxial films and the polycrystalline films grown at CH<jats:sub>4</jats:sub>=6% had graphitic components. \n </jats:p>",
  "DOI": "10.1143/jjap.29.34",
  "type": "journal-article",
  "created": {
    "date-parts": [
      [
        2005,
        2,
        28
      ]
    ],
    "date-time": "2005-02-28T03:05:19Z",
    "timestamp": 1109559919000
  },
  "page": "34",
  "update-policy": "https://doi.org/10.1088/crossmark-policy",
  "source": "Crossref",
  "is-referenced-by-count": 78,
  "title": "Epitaxial Growth of High Quality Diamond Film by the Microwave Plasma-Assisted Chemical-Vapor-Deposition Method",
  "prefix": "10.35848",
  "volume": "29",
  "author": [
    {
      "given": "Hiromu",
      "family": "Shiomi",
      "sequence": "first",
      "affiliation": []
    },
    {
      "given": "Keiichirou",
      "family": "Tanabe",
      "sequence": "additional",
      "affiliation": []
    },
    {
      "given": "Yoshiki",
      "family": "Nishibayashi",
      "sequence": "additional",
      "affiliation": []
    },
    {
      "given": "Naoji",
      "family": "Fujimori",
      "sequence": "additional",
      "affiliation": []
    }
  ],
  "member": "266",
  "reference": [
    {
      "key": "",
      "first-page": "720",
      "volume": "16",
      "year": "1982",
      "journal-title": "Sov. Phys.-Semicond."
    },
    {
      "key": "",
      "first-page": "146",
      "volume": "17",
      "year": "1983",
      "journal-title": "Sov. Phys.-Semicond."
    },
    {
      "key": "",
      "first-page": "829",
      "volume": "19",
      "year": "1985",
      "journal-title": "Sov. Phys.-Semicond."
    },
    {
      "key": "",
      "doi-asserted-by": "publisher",
      "first-page": "333",
      "DOI": "10.1016/0038-1098(79)90645-8",
      "volume": "30",
      "year": "1979",
      "journal-title": "Solid State Commun."
    },
    {
      "year": "1970",
      "key": ""
    },
    {
      "key": "",
      "doi-asserted-by": "publisher",
      "first-page": "341",
      "DOI": "10.1109/EDL.1987.26653",
      "volume": "8",
      "year": "1987",
      "journal-title": "IEEE Electron Device Lett."
    },
    {
      "key": "",
      "doi-asserted-by": "publisher",
      "first-page": "3668",
      "DOI": "10.1063/1.1841272",
      "volume": "46",
      "year": "1967",
      "journal-title": "J. Chem. Phys."
    },
    {
      "key": "",
      "doi-asserted-by": "publisher",
      "first-page": "99",
      "DOI": "10.1016/0042-207X(86)90279-4",
      "volume": "36",
      "year": "1986",
      "journal-title": "Vacuum"
    },
    {
      "key": "",
      "doi-asserted-by": "publisher",
      "first-page": "758",
      "DOI": "10.1143/JJAP.28.758",
      "volume": "28",
      "year": "1989",
      "journal-title": "Jpn. J. Appl. Phys."
    },
    {
      "key": "",
      "doi-asserted-by": "publisher",
      "first-page": "353",
      "DOI": "10.1016/0378-4363(81)90274-6",
      "volume": "105B",
      "year": "1981",
      "journal-title": "Physica B+C."
    },
    {
      "key": "",
      "doi-asserted-by": "publisher",
      "first-page": "1687",
      "DOI": "10.1103/PhysRevB.1.1687",
      "volume": "B1",
      "year": "1970",
      "journal-title": "Phys. Rev."
    },
    {
      "key": "",
      "doi-asserted-by": "publisher",
      "first-page": "3482",
      "DOI": "10.1103/PhysRevB.29.3482",
      "volume": "29",
      "year": "1984",
      "journal-title": "Phys. Rev. B"
    },
    {
      "key": "",
      "doi-asserted-by": "publisher",
      "first-page": "322",
      "DOI": "10.1366/0003702864509295",
      "volume": "40",
      "year": "1986",
      "journal-title": "Appl. Spectros."
    },
    {
      "key": "",
      "doi-asserted-by": "publisher",
      "first-page": "1126",
      "DOI": "10.1063/1.1674108",
      "volume": "53",
      "year": "1970",
      "journal-title": "J. Chem. Phys."
    },
    {
      "key": "",
      "doi-asserted-by": "publisher",
      "first-page": "460",
      "DOI": "10.1295/polymj.4.460",
      "volume": "4",
      "year": "1973",
      "journal-title": "Polym. J."
    },
    {
      "key": "",
      "doi-asserted-by": "publisher",
      "first-page": "4067",
      "DOI": "10.1103/PhysRevB.38.4067",
      "volume": "38",
      "year": "1988",
      "journal-title": "Phys. Rev. B"
    }
  ],
  "container-title": "Japanese Journal of Applied Physics",
  "original-title": [],
  "link": [
    {
      "URL": "https://iopscience.iop.org/article/10.1143/JJAP.29.34",
      "content-type": "text/html",
      "content-version": "vor",
      "intended-application": "text-mining"
    },
    {
      "URL": "https://iopscience.iop.org/article/10.1143/JJAP.29.34/pdf",
      "content-type": "application/pdf",
      "content-version": "vor",
      "intended-application": "text-mining"
    },
    {
      "URL": "https://iopscience.iop.org/article/10.1143/JJAP.29.34/pdf",
      "content-type": "application/pdf",
      "content-version": "vor",
      "intended-application": "syndication"
    },
    {
      "URL": "https://iopscience.iop.org/article/10.1143/JJAP.29.34/pdf",
      "content-type": "application/pdf",
      "content-version": "vor",
      "intended-application": "similarity-checking"
    }
  ],
  "deposited": {
    "date-parts": [
      [
        2022,
        12,
        6
      ]
    ],
    "date-time": "2022-12-06T13:10:36Z",
    "timestamp": 1670332236000
  },
  "score": 1,
  "resource": {
    "primary": {
      "URL": "https://iopscience.iop.org/article/10.1143/JJAP.29.34"
    }
  },
  "subtitle": [],
  "short-title": [],
  "issued": {
    "date-parts": [
      [
        1990,
        1,
        1
      ]
    ]
  },
  "references-count": 16,
  "journal-issue": {
    "issue": "1R",
    "published-print": {
      "date-parts": [
        [
          1990,
          1,
          1
        ]
      ]
    }
  },
  "URL": "http://dx.doi.org/10.1143/JJAP.29.34",
  "relation": {},
  "ISSN": [
    "0021-4922",
    "1347-4065"
  ],
  "subject": [],
  "container-title-short": "Jpn. J. Appl. Phys.",
  "published": {
    "date-parts": [
      [
        1990,
        1,
        1
      ]
    ]
  },
  "assertion": [
    {
      "value": "Epitaxial Growth of High Quality Diamond Film by the Microwave Plasma-Assisted Chemical-Vapor-Deposition Method",
      "name": "article_title",
      "label": "Article Title"
    },
    {
      "value": "Japanese Journal of Applied Physics",
      "name": "journal_title",
      "label": "Journal Title"
    },
    {
      "value": "paper",
      "name": "article_type",
      "label": "Article Type"
    },
    {
      "value": "Copyright (c) 1990 The Japan Society of Applied Physics",
      "name": "copyright_information",
      "label": "Copyright Information"
    },
    {
      "value": "1989-09-21",
      "name": "date_received",
      "label": "Date Received",
      "group": {
        "name": "publication_dates",
        "label": "Publication dates"
      }
    },
    {
      "value": "1989-11-18",
      "name": "date_accepted",
      "label": "Date Accepted",
      "group": {
        "name": "publication_dates",
        "label": "Publication dates"
      }
    },
    {
      "name": "date_epub",
      "label": "Online publication date",
      "group": {
        "name": "publication_dates",
        "label": "Publication dates"
      }
    }
  ]
}