DOI: 10.1143/jjap.28.l1464. Quantum Size Effects in Ge Microcrystals Embedded in SiO<sub>2</sub> Thin Films

Quantum Size Effects in Ge Microcrystals Embedded in SiO2 Thin Films

10.1143/jjap.28.l1464

Crossref journal-article

IOP Publishing

Japanese Journal of Applied Physics (266)

Abstract

By applying an rf co-sputtering technique, we have succeeded in producing Ge microcrystals in SiO2 thin films for which direct characterization by transmission electron microscopy is possible. As the size of the Ge microcrystals decreased from 6.5 to 2.7 nm, the optical extinction (absorption) spectra changed drastically. The structures corresponding to interband transitions in bulk Ge disappeared, and the onset of extinction shifted to higher energies. These spectral changes seem to arise from the three-dimensional confinement of electrons and holes in the microcrystals.

Bibliography

Hayashi, S., Fujii, M., & Yamamoto, K. (1989). Quantum Size Effects in Ge Microcrystals Embedded in SiO2 Thin Films. Japanese Journal of Applied Physics, 28(8A), L1464.

Authors 3

Shinji Hayashi (first)
Minoru Fujii (additional)
Keiichi Yamamoto (additional)

References 14 Referenced 61

10.1002/pssb.2221450222 / Phys. Status Solidi B (1988)
10.1002/pssb.2221460215 / Phys. Status Solidi B (1988)
10.1016/S0038-1098(85)80025-9 / Solid State Commun. (1985)
10.1103/PhysRevB.37.10838 / Phys. Rev. (1988)
10.1063/1.338280 / J. Appl. Phys. (1987)
10.1143/JJAP.28.484 / Jpn. J. Appl. Phys. (1989)
10.1103/PhysRevB.32.5529 / Phys. Rev. B (1985)
10.1143/JJAP.28.477 / Jpn. J. Appl. Phys. (1989)
10.1364/JOSAB.5.001650 / J. Opt. Soc. Am. B (1988)
10.1103/PhysRevB.37.1273 / Phys. Rev. (1988)
{'key': ''}
10.1103/PhysRevB.38.5726 / Phys. Rev. (1988)
{'year': '1983', 'key': ''} (1983)
10.1103/PhysRevLett.9.94 / Phys. Rev. Lett. (1962)

Dates

Type	When
Created	20 years, 6 months ago (Feb. 22, 2005, 8:34 p.m.)
Deposited	2 years, 8 months ago (Dec. 6, 2022, 6:40 a.m.)
Indexed	1 month, 4 weeks ago (June 30, 2025, 7:27 a.m.)
Issued	36 years ago (Aug. 1, 1989)
Published	36 years ago (Aug. 1, 1989)
Published Print	36 years ago (Aug. 1, 1989)

Funders 0

None

BibTeX

@article{Hayashi_1989, title={Quantum Size Effects in Ge Microcrystals Embedded in SiO2 Thin Films}, volume={28}, ISSN={1347-4065}, url={http://dx.doi.org/10.1143/jjap.28.l1464}, DOI={10.1143/jjap.28.l1464}, number={8A}, journal={Japanese Journal of Applied Physics}, publisher={IOP Publishing}, author={Hayashi, Shinji and Fujii, Minoru and Yamamoto, Keiichi}, year={1989}, month=aug, pages={L1464} }

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