Crossref journal-article
IOP Publishing
Japanese Journal of Applied Physics (266)
Abstract

The reaction kinetics describing the CH3OH decomposition in CVD conditions are studied by the comparison between the measured and the simulated time-varying gas concentrations. The chemical kinetic calculation for the deposition of the diamondlike film by the conventional tungsten filament method is carried out by making use of a simplified one-dimensional model, and it is shown that CH3is the mainC-containing radical. The overall sticking probability of CH3is roughly estimated as β(CH3)=10-2for the silicon substrate heated to 1000 K.

Bibliography

Matsui, Y., & Sahara, M. (1989). Chemical Kinetic Analysis on the Growth Mechanism of Diamondlike Films from a CH3OH–H2Mixture. Japanese Journal of Applied Physics, 28(6R), 1023.

Authors 2
  1. Yasuji Matsui (first)
  2. Mieko Sahara (additional)
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Dates
Type When
Created 20 years, 6 months ago (Feb. 22, 2005, 8:32 p.m.)
Deposited 1 year, 7 months ago (Jan. 23, 2024, 12:48 p.m.)
Indexed 2 months, 1 week ago (June 24, 2025, 12:29 p.m.)
Issued 36 years, 3 months ago (June 1, 1989)
Published 36 years, 3 months ago (June 1, 1989)
Published Print 36 years, 3 months ago (June 1, 1989)
Funders 0

None

@article{Matsui_1989, title={Chemical Kinetic Analysis on the Growth Mechanism of Diamondlike Films from a CH3OH–H2Mixture}, volume={28}, ISSN={1347-4065}, url={http://dx.doi.org/10.1143/jjap.28.1023}, DOI={10.1143/jjap.28.1023}, number={6R}, journal={Japanese Journal of Applied Physics}, publisher={IOP Publishing}, author={Matsui, Yasuji and Sahara, Mieko}, year={1989}, month=jun, pages={1023} }