Abstract
Non-doped 3C-SiC epilayers having mobility higher than 750 cm2/(V ·s) at room temperature and 3000 cm2/(V ·s) around 66 K were obtained for the first time, using large size (60×70 mm2) Si substrates. The conditions for obtaining such high-mobility epilayers are discussed in terms of the distribution of the electrical properties over the epilayers and their substrate size dependence.
References
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Dates
Type | When |
---|---|
Created | 20 years, 6 months ago (Feb. 22, 2005, 8:20 p.m.) |
Deposited | 2 years, 8 months ago (Dec. 5, 2022, 3:01 p.m.) |
Indexed | 4 weeks ago (Aug. 2, 2025, 1:21 a.m.) |
Issued | 37 years, 5 months ago (March 1, 1988) |
Published | 37 years, 5 months ago (March 1, 1988) |
Published Print | 37 years, 5 months ago (March 1, 1988) |
@article{Shinohara_1988, title={Growth of High-Mobility 3C-SiC Epilayers by Chemical Vapor Deposition}, volume={27}, ISSN={1347-4065}, url={http://dx.doi.org/10.1143/jjap.27.l434}, DOI={10.1143/jjap.27.l434}, number={3A}, journal={Japanese Journal of Applied Physics}, publisher={IOP Publishing}, author={Shinohara, Mikiya and Yamanaka, Mitsugu and Daimon, Hiroshi and Sakuma, Eiichiro and Okumura, Hajime and Misawa, Shunji and Endo, Kazuhiro and Yoshida, Sadafumi}, year={1988}, month=mar, pages={L434} }