Abstract
It is demonstrated that a deep level of a paramagnetic off-center substitutional N can be determined by electron spin resonance (ESR) measurements of the peak-to-peak derivative linewidth Δ H msl over a wide temperature region from 150 to 550 K. The temperature dependence of Δ H msl observed above ∼330 K is interpreted in terms of one type of motional broadening. According to this model, we obtain an energy level of 0.33±0.02 eV below the conduction band and the electron capture cross section σ0 of 1.0×10-15 cm2, which are in agreement with one of the levels obtained by deep-level transient spectroscopy (DLTS).
References
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Dates
Type | When |
---|---|
Created | 20 years, 6 months ago (Feb. 22, 2005, 8:24 p.m.) |
Deposited | 2 years, 8 months ago (Dec. 5, 2022, 3:13 p.m.) |
Indexed | 6 months, 1 week ago (Feb. 21, 2025, 5:34 a.m.) |
Issued | 37 years ago (Aug. 1, 1988) |
Published | 37 years ago (Aug. 1, 1988) |
Published Print | 37 years ago (Aug. 1, 1988) |
@article{Murakami_1988, title={Electronic Energy Level of Off-Center Substitutional Nitrogen in Silicon: Determination by Electron Spin Resonance Measurements}, volume={27}, ISSN={1347-4065}, url={http://dx.doi.org/10.1143/jjap.27.l1414}, DOI={10.1143/jjap.27.l1414}, number={8A}, journal={Japanese Journal of Applied Physics}, publisher={IOP Publishing}, author={Murakami, Kouichi and Kuribayashi, Hitoshi and Masuda, Kohzoh}, year={1988}, month=aug, pages={L1414} }