DOI: 10.1143/jjap.26.l1199. Synthesis of Y-Ba-Cu-O Thin Films on Sapphire Substrates by RF Magnetron Sputtering

Synthesis of Y-Ba-Cu-O Thin Films on Sapphire Substrates by RF Magnetron Sputtering

10.1143/jjap.26.l1199

Crossref journal-article

IOP Publishing

Japanese Journal of Applied Physics (266)

Abstract

Y-Ba-Cu-O thin films have been prepared on sapphire substrates by RF magnetron sputtering from sintered targets. The substrate temperature dependence of Ba and Cu concentrations against Y of as-sputtered films has been clarified. Film composition deviated from target composition. Cu concentration decreased significantly with increasing T s, while Ba concentration was independent of the substrate temperature. Using the CuO-compensated Y1Ba6Cu10O x target, assputtered high-T c films (T c onset=87 K, T c endpoint=40 K) have been successfully obtained as a T s of about 580°C.

Bibliography

Michikami, O., Asano, H., Katoh, Y., Kubo, S., & Tanabe, K. (1987). Synthesis of Y-Ba-Cu-O Thin Films on Sapphire Substrates by RF Magnetron Sputtering. Japanese Journal of Applied Physics, 26(7A), L1199.

Authors 5

Osamu Michikami (first)
Hidefumi Asano (additional)
Yujiro Katoh (additional)
Shugo Kubo (additional)
Keiichi Tanabe (additional)

References 6 Referenced 47

10.1103/PhysRevLett.58.908 / Phys. Rev. Lett. (1987)
10.1143/JJAP.26.L314 / Jpn. J. Appl. Phys. (1987)
10.1143/JJAP.26.L476 / Jpn. J. Appl. Phys. (1987)
10.1143/JJAP.26.L498 / Jpn. J. Appl. Phys. (1987)
10.1143/JJAP.26.L460 / Jpn. J. Appl. Phys. (1987)
10.1143/JJAP.26.L508 / Jpn. J. Appl. Phys. (1987)

Dates

Type	When
Created	19 years, 9 months ago (Nov. 4, 2005, 12:35 a.m.)
Deposited	2 years, 8 months ago (Dec. 5, 2022, 1:19 p.m.)
Indexed	6 months, 1 week ago (Feb. 21, 2025, 5:35 a.m.)
Issued	38 years, 1 month ago (July 1, 1987)
Published	38 years, 1 month ago (July 1, 1987)
Published Print	38 years, 1 month ago (July 1, 1987)

Funders 0

None

BibTeX

@article{Michikami_1987, title={Synthesis of Y-Ba-Cu-O Thin Films on Sapphire Substrates by RF Magnetron Sputtering}, volume={26}, ISSN={1347-4065}, url={http://dx.doi.org/10.1143/jjap.26.l1199}, DOI={10.1143/jjap.26.l1199}, number={7A}, journal={Japanese Journal of Applied Physics}, publisher={IOP Publishing}, author={Michikami, Osamu and Asano, Hidefumi and Katoh, Yujiro and Kubo, Shugo and Tanabe, Keiichi}, year={1987}, month=jul, pages={L1199} }

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