DOI: 10.1143/jjap.22.l171. Formation of Cubic Boron Nitride Films by Boron Evaporation and Nitrogen Ion Beam Bombardment

Formation of Cubic Boron Nitride Films by Boron Evaporation and Nitrogen Ion Beam Bombardment

10.1143/jjap.22.l171

Crossref journal-article

IOP Publishing

Japanese Journal of Applied Physics (266)

Abstract

The resistivity and structure of films deposited on tantalum and rocksalt substrates by the electron beam evaporation of boron and the simultaneous bombardment of 30 keV N2 + ion beam were studied. From observation by transmission electron microscope, it was found that cubic boron nitride was produced in the case where the prepared composition rate of boron to nitrogen was 2.5.

Bibliography

Satou, M., & Fujimoto, F. (1983). Formation of Cubic Boron Nitride Films by Boron Evaporation and Nitrogen Ion Beam Bombardment. Japanese Journal of Applied Physics, 22(3A), L171.

Authors 2

Mamoru Satou (first)
Fuminori Fujimoto (additional)

References 5 Referenced 142

{'year': '1977', 'key': ''} (1977)
{'year': '1981', 'key': ''} (1981)
10.1016/0040-6090(80)90257-6 / Thin Solid Films (1980)
{'year': '1981', 'key': ''} (1981)
{'year': '1982', 'key': ''} (1982)

Dates

Type	When
Created	19 years, 9 months ago (Nov. 4, 2005, 1:02 a.m.)
Deposited	2 years, 8 months ago (Nov. 29, 2022, 5:17 a.m.)
Indexed	3 months, 3 weeks ago (May 1, 2025, 5:05 a.m.)
Issued	42 years, 5 months ago (March 1, 1983)
Published	42 years, 5 months ago (March 1, 1983)
Published Print	42 years, 5 months ago (March 1, 1983)

Funders 0

None

BibTeX

@article{Satou_1983, title={Formation of Cubic Boron Nitride Films by Boron Evaporation and Nitrogen Ion Beam Bombardment}, volume={22}, ISSN={1347-4065}, url={http://dx.doi.org/10.1143/jjap.22.l171}, DOI={10.1143/jjap.22.l171}, number={3A}, journal={Japanese Journal of Applied Physics}, publisher={IOP Publishing}, author={Satou, Mamoru and Fujimoto, Fuminori}, year={1983}, month=mar, pages={L171} }

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