DOI: 10.1143/jjap.19.21. Effect of Substrate Temperature on Crystallization of Amorphous Antimony Film

Effect of Substrate Temperature on Crystallization of Amorphous Antimony Film

10.1143/jjap.19.21

Crossref journal-article

IOP Publishing

Japanese Journal of Applied Physics (266)

Bibliography

Hashimoto, M., Niizeki, T., & Kambe, K. (1980). Effect of Substrate Temperature on Crystallization of Amorphous Antimony Film. Japanese Journal of Applied Physics, 19(1), 21â23.

Authors 3

Mituru Hashimoto (first)
Takashi Niizeki (additional)
Kenjiro Kambe (additional)

References 0 Referenced 40

None

Dates

Type	When
Created	19 years, 9 months ago (Nov. 4, 2005, 1:21 a.m.)
Deposited	5 years, 2 months ago (May 31, 2020, 7:22 p.m.)
Indexed	1 year, 6 months ago (Feb. 4, 2024, 10:57 p.m.)
Issued	45 years, 7 months ago (Jan. 1, 1980)
Published	45 years, 7 months ago (Jan. 1, 1980)
Published Print	45 years, 7 months ago (Jan. 1, 1980)

Funders 0

None

BibTeX

@article{Hashimoto_1980, title={Effect of Substrate Temperature on Crystallization of Amorphous Antimony Film}, volume={19}, ISSN={1347-4065}, url={http://dx.doi.org/10.1143/jjap.19.21}, DOI={10.1143/jjap.19.21}, number={1}, journal={Japanese Journal of Applied Physics}, publisher={IOP Publishing}, author={Hashimoto, Mituru and Niizeki, Takashi and Kambe, Kenjiro}, year={1980}, month=jan, pages={21–23} }

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