DOI: 10.1142/s0217979289000555. REPRODUCIBLE TECHNIQUE FOR DEPOSITION OF Y–Ba–Cu

REPRODUCIBLE TECHNIQUE FOR DEPOSITION OF Y–Ba–Cu–O THIN FILM FROM RF SPUTTERING

10.1142/s0217979289000555

Crossref journal-article

World Scientific Pub Co Pte Lt

International Journal of Modern Physics B (219)

Abstract

The composition of Y–Ba–Cu–O thin films deposited by RF sputtering was found to depend strongly on the substrate location and accumulated sputtering time, if a stoichiometric compound target was used. The film is seriously off-stoichiometric, with Ba being deficient, and Cu and Y in excess not only for the centered substrate, but also for the off-centered substrate. However, after prolonged sputtering, stable conditions can be obtained and a right film composition achieved for the off-centered substrate. A more powerful technique for obtaining stoichiometry in as-deposited thin films can be realized by arranging the substrate perpendicular to the target. The accumulated sputtering time for obtaining reproducible stoichiometric, as-deposited films is directly related to the substrate location. A stoichiometric thin film was obtained during the first deposition from a new target and repeated in many following runs.

Bibliography

JIA, Q. X., REN, D., & ANDERSON, W. A. (1989). REPRODUCIBLE TECHNIQUE FOR DEPOSITION OF YâBaâCuâO THIN FILM FROM RF SPUTTERING. International Journal of Modern Physics B, 03(05), 743â749.

Authors 3

Q. X. JIA (first)
D. REN (additional)
W. A. ANDERSON (additional)

References 0 Referenced 5

None

Dates

Type	When
Created	20 years, 9 months ago (Nov. 28, 2004, 9:14 p.m.)
Deposited	6 years ago (Aug. 6, 2019, 8:07 p.m.)
Indexed	1 year, 7 months ago (Feb. 2, 2024, 8:38 p.m.)
Issued	36 years, 4 months ago (May 1, 1989)
Published	36 years, 4 months ago (May 1, 1989)
Published Online	13 years, 7 months ago (Jan. 25, 2012)
Published Print	36 years, 4 months ago (May 1, 1989)

Funders 0

None

BibTeX

@article{JIA_1989, title={REPRODUCIBLE TECHNIQUE FOR DEPOSITION OF Y–Ba–Cu–O THIN FILM FROM RF SPUTTERING}, volume={03}, ISSN={1793-6578}, url={http://dx.doi.org/10.1142/s0217979289000555}, DOI={10.1142/s0217979289000555}, number={05}, journal={International Journal of Modern Physics B}, publisher={World Scientific Pub Co Pte Lt}, author={JIA, Q. X. and REN, D. and ANDERSON, W. A.}, year={1989}, month=may, pages={743–749} }

JSON

{
  "indexed": {
    "date-parts": [
      [
        2024,
        2,
        3
      ]
    ],
    "date-time": "2024-02-03T01:38:44Z",
    "timestamp": 1706924324038
  },
  "reference-count": 0,
  "publisher": "World Scientific Pub Co Pte Lt",
  "issue": "05",
  "content-domain": {
    "domain": [],
    "crossmark-restriction": false
  },
  "published-print": {
    "date-parts": [
      [
        1989,
        5
      ]
    ]
  },
  "abstract": "<jats:p> The composition of Y\u2013Ba\u2013Cu\u2013O thin films deposited by RF sputtering was found to depend strongly on the substrate location and accumulated sputtering time, if a stoichiometric compound target was used. The film is seriously off-stoichiometric, with Ba being deficient, and Cu and Y in excess not only for the centered substrate, but also for the off-centered substrate. However, after prolonged sputtering, stable conditions can be obtained and a right film composition achieved for the off-centered substrate. A more powerful technique for obtaining stoichiometry in as-deposited thin films can be realized by arranging the substrate perpendicular to the target. The accumulated sputtering time for obtaining reproducible stoichiometric, as-deposited films is directly related to the substrate location. A stoichiometric thin film was obtained during the first deposition from a new target and repeated in many following runs. </jats:p>",
  "DOI": "10.1142/s0217979289000555",
  "type": "journal-article",
  "created": {
    "date-parts": [
      [
        2004,
        11,
        29
      ]
    ],
    "date-time": "2004-11-29T02:14:37Z",
    "timestamp": 1101694477000
  },
  "page": "743-749",
  "source": "Crossref",
  "is-referenced-by-count": 5,
  "title": "REPRODUCIBLE TECHNIQUE FOR DEPOSITION OF Y\u2013Ba\u2013Cu\u2013O THIN FILM FROM RF SPUTTERING",
  "prefix": "10.1142",
  "volume": "03",
  "author": [
    {
      "given": "Q. X.",
      "family": "JIA",
      "sequence": "first",
      "affiliation": [
        {
          "name": "State University of New York at Buffalo, Center for Electronic and Electro-optic Materials, Amherst, NY 14260, USA"
        }
      ]
    },
    {
      "given": "D.",
      "family": "REN",
      "sequence": "additional",
      "affiliation": [
        {
          "name": "State University of New York at Buffalo, Center for Electronic and Electro-optic Materials, Amherst, NY 14260, USA"
        }
      ]
    },
    {
      "given": "W. A.",
      "family": "ANDERSON",
      "sequence": "additional",
      "affiliation": [
        {
          "name": "State University of New York at Buffalo, Center for Electronic and Electro-optic Materials, Amherst, NY 14260, USA"
        }
      ]
    }
  ],
  "member": "219",
  "published-online": {
    "date-parts": [
      [
        2012,
        1,
        25
      ]
    ]
  },
  "container-title": "International Journal of Modern Physics B",
  "original-title": [],
  "language": "en",
  "link": [
    {
      "URL": "https://www.worldscientific.com/doi/pdf/10.1142/S0217979289000555",
      "content-type": "unspecified",
      "content-version": "vor",
      "intended-application": "similarity-checking"
    }
  ],
  "deposited": {
    "date-parts": [
      [
        2019,
        8,
        7
      ]
    ],
    "date-time": "2019-08-07T00:07:55Z",
    "timestamp": 1565136475000
  },
  "score": 1,
  "resource": {
    "primary": {
      "URL": "https://www.worldscientific.com/doi/abs/10.1142/S0217979289000555"
    }
  },
  "subtitle": [],
  "short-title": [],
  "issued": {
    "date-parts": [
      [
        1989,
        5
      ]
    ]
  },
  "references-count": 0,
  "journal-issue": {
    "issue": "05",
    "published-online": {
      "date-parts": [
        [
          2012,
          1,
          25
        ]
      ]
    },
    "published-print": {
      "date-parts": [
        [
          1989,
          5
        ]
      ]
    }
  },
  "alternative-id": [
    "10.1142/S0217979289000555"
  ],
  "URL": "http://dx.doi.org/10.1142/S0217979289000555",
  "relation": {},
  "ISSN": [
    "0217-9792",
    "1793-6578"
  ],
  "subject": [],
  "container-title-short": "Int. J. Mod. Phys. B",
  "published": {
    "date-parts": [
      [
        1989,
        5
      ]
    ]
  }
}