Abstract
Electronic junctions on edge Two-dimensional materials such as graphene are attractive materials for making smaller transistors because they are inherently nanoscale and can carry high currents. However, graphene has no band gap and the transistors are “leaky”; that is, they are hard to turn off. Related transition metal dichalcogenides (TMDCs) such as molybdenum sulfide have band gaps. Transistors based on these materials can have high ratios of “on” to “off” currents. However, it is often difficult to make a good voltage-biased (p-n) junction between different TMDC materials. Li et al. succeeded in making p-n heterojunctions between two of these materials, molybdenum sulfide and tungsten selenide. They did this not by stacking the layers, which make a weak junction, but by growing molybdenum sulfide on the edge of a triangle of tungsten selenide with an atomically sharp boundary Science , this issue p. 524
Bibliography
Li, M.-Y., Shi, Y., Cheng, C.-C., Lu, L.-S., Lin, Y.-C., Tang, H.-L., Tsai, M.-L., Chu, C.-W., Wei, K.-H., He, J.-H., Chang, W.-H., Suenaga, K., & Li, L.-J. (2015). Epitaxial growth of a monolayer WSe 2 -MoS 2 lateral p-n junction with an atomically sharp interface. Science, 349(6247), 524â528.
Authors
13
- Ming-Yang Li (first)
- Yumeng Shi (additional)
- Chia-Chin Cheng (additional)
- Li-Syuan Lu (additional)
- Yung-Chang Lin (additional)
- Hao-Lin Tang (additional)
- Meng-Lin Tsai (additional)
- Chih-Wei Chu (additional)
- Kung-Hwa Wei (additional)
- Jr-Hau He (additional)
- Wen-Hao Chang (additional)
- Kazu Suenaga (additional)
- Lain-Jong Li (additional)
References
38
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Funders
7
Ministry of Science and Technology
10.13039/100007225
Region: Asia
gov (National government)
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- Ministry of Science and Technology of the Socialist Republic of Vietnam
- Vietnamese Ministry of Science and Technology
- MOST
MOST of Taiwan
10.13039/100007225
Ministry of Science and TechnologyRegion: Asia
gov (National government)
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- Ministry of Science and Technology of the Socialist Republic of Vietnam
- Vietnamese Ministry of Science and Technology
- MOST
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- NSC102-2119-M-009-002-MY3
Academia Sinica
10.13039/501100001869
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- 中國科學院
- Academia Sinica's
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Japan Science and Technology Agency
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- SCIENCE AND TECHNOLOGY AGENCY OF JAPAN
- 国立研究開発法人科学技術振興機構
- 国立研究開発法人科学技術振興機構 japan science and technology agency
- Japan Science and Technology Agency (JST)
- かがくぎじゅつしんこうきこう
- 科学技術振興機構
- JST
King Abdullah University of Science and Technology
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- جامعة الملك عبدالله للعلوم والتقنية
- KAUST
Taiwan Consortium of Emergent Crystalline Materials (TCEM)
TCEM
@article{Li_2015, title={Epitaxial growth of a monolayer WSe 2 -MoS 2 lateral p-n junction with an atomically sharp interface}, volume={349}, ISSN={1095-9203}, url={http://dx.doi.org/10.1126/science.aab4097}, DOI={10.1126/science.aab4097}, number={6247}, journal={Science}, publisher={American Association for the Advancement of Science (AAAS)}, author={Li, Ming-Yang and Shi, Yumeng and Cheng, Chia-Chin and Lu, Li-Syuan and Lin, Yung-Chang and Tang, Hao-Lin and Tsai, Meng-Lin and Chu, Chih-Wei and Wei, Kung-Hwa and He, Jr-Hau and Chang, Wen-Hao and Suenaga, Kazu and Li, Lain-Jong}, year={2015}, month=jul, pages={524–528} }