Crossref journal-article
American Association for the Advancement of Science (AAAS)
Science (221)
Abstract

Negative differential resistance (NDR) is the essential property that allows fast switching in certain types of electronic devices. With scanning tunneling microscopy (STM) and scanning tunneling spectroscopy, it is shown that the current-voltage characteristics of a diode configuration consisting of an STM tip over specific sites of a boron-exposed silicon(111) surface exhibit NDR. These NDR-active sites are of atomic dimensions (∼1 nanometer). NDR in this case is the result of tunneling through localized, atomic-like states. Thus, desirable device characteristics can be obtained even on the atomic scale.

Bibliography

Lyo, I.-W., & Avouris, P. (1989). Negative Differential Resistance on the Atomic Scale: Implications for Atomic Scale Devices. Science, 245(4924), 1369–1371.

Authors 2
  1. In-Whan Lyo (first)
  2. Phaedon Avouris (additional)
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Dates
Type When
Created 18 years, 10 months ago (Oct. 5, 2006, 5:21 p.m.)
Deposited 1 year, 7 months ago (Jan. 12, 2024, 11:44 a.m.)
Indexed 2 weeks, 5 days ago (Aug. 6, 2025, 9:58 a.m.)
Issued 35 years, 11 months ago (Sept. 22, 1989)
Published 35 years, 11 months ago (Sept. 22, 1989)
Published Print 35 years, 11 months ago (Sept. 22, 1989)
Funders 0

None

@article{Lyo_1989, title={Negative Differential Resistance on the Atomic Scale: Implications for Atomic Scale Devices}, volume={245}, ISSN={1095-9203}, url={http://dx.doi.org/10.1126/science.245.4924.1369}, DOI={10.1126/science.245.4924.1369}, number={4924}, journal={Science}, publisher={American Association for the Advancement of Science (AAAS)}, author={Lyo, In-Whan and Avouris, Phaedon}, year={1989}, month=sep, pages={1369–1371} }