Abstract
Grain boundaries affect the migration of atoms and electrons in polycrystalline solids, thus influencing many of the mechanical and electrical properties. By introducing nanometer-scale twin defects into copper grains, we show that we can change the grain-boundary structure and atomic-diffusion behavior along the boundary. Using in situ ultrahigh-vacuum and high-resolution transmission electron microscopy, we observed electromigration-induced atomic diffusion in the twin-modified grain boundaries. The triple point where a twin boundary meets a grain boundary was found to slow down grain-boundary and surface electromigration by one order of magnitude. We propose that this occurs because of the incubation time of nucleation of a new step at the triple points. The long incubation time slows down the overall rate of atomic transport.
References
21
Referenced
369
-
E. O. Hall, Proc. Phys. Soc. London Sect. B64, 747 (1951).
(
10.1088/0370-1301/64/9/303
) / Proc. Phys. Soc. London Sect. B (1951) - N. J. Petch, J. Iron Steel Inst. London174, 25 (1953). / J. Iron Steel Inst. London (1953)
-
R. W. Balluffi, R. F. Mehl, Metall. Mater. Trans. A13, 2069 (1982).
(
10.1007/BF02648378
) / Metall. Mater. Trans. A (1982) -
S. W. Chan, R. W. Balluffi, Acta Metall.33, 1113 (1985).
(
10.1016/0001-6160(85)90205-6
) / Acta Metall. (1985) 10.1126/science.1092905
-
C. K. Hu, J. M. E. Harper, Mater. Chem. Phys.52, 5 (1998).
(
10.1016/S0254-0584(98)80000-X
) / Mater. Chem. Phys. (1998) -
R. Frankovic, G. H. Bernstein, IEEE Trans. Electron. Dev.43, 2233 (1996).
(
10.1109/16.544396
) / IEEE Trans. Electron. Dev. (1996) -
P. Børgesen, J. K. Lee, R. Gleixner, C. Y. Li, Appl. Phys. Lett.60, 1706 (1992).
(
10.1063/1.107192
) / Appl. Phys. Lett. (1992) -
I. A. Blech, J. Appl. Phys.47, 1203 (1976).
(
10.1063/1.322842
) / J. Appl. Phys. (1976) -
C. K. Hu, R. Rosenberg, K. Y. Lee, Appl. Phys. Lett.74, 2945 (1999).
(
10.1063/1.123974
) / Appl. Phys. Lett. (1999) -
C. S. Hau-Riege, Microelectron. Reliab.44, 195 (2004).
(
10.1016/j.microrel.2003.10.020
) / Microelectron. Reliab. (2004) -
K. N. Tu, J. Appl. Phys.94, 5451 (2003).
(
10.1063/1.1611263
) / J. Appl. Phys. (2003) -
J. S. Huang, T. L. Shofner, J. Zhao, J. Appl. Phys.89, 2130 (2001).
(
10.1063/1.1340004
) / J. Appl. Phys. (2001) -
E. Liniger, L. Gignac, C. K. Hu, S. Kaldor, J. Appl. Phys.92, 1803 (2002).
(
10.1063/1.1492871
) / J. Appl. Phys. (2002) - C. K. Hu, K. Y. Lee, L. Gignac, R. Carruthers, Thin Solid Films308-309, 443 (1997). / Thin Solid Films (1997)
-
C. N. Liao, K. C. Chen, W. W. Wu, L. J. Chen, Appl. Phys. Lett.87, 141903 (2005).
(
10.1063/1.2081138
) / Appl. Phys. Lett. (2005) -
K. C. Chen, C. N. Liao, W. W. Wu, L. J. Chen, Appl. Phys. Lett.90, 203101 (2007).
(
10.1063/1.2740109
) / Appl. Phys. Lett. (2007) - See supporting material on Science Online.
-
M. Karimi, T. Tomkowski, Phys. Rev. B52, 5364 (1995).
(
10.1103/PhysRevB.52.5364
) / Phys. Rev. B (1995) - A. P. Sutton, R. W. Balluffi, in Interfaces in Crystalline Materials (Clarendon Press, Oxford, 1995), chap. 10, p. 598. / Interfaces in Crystalline Materials (1995)
- The work was supported by the National Science Council through grants NSC 96-2120-M-007-006 and 96-2628-E-007-018-MY3. K.N.T. acknowledges the support of NSF–Nanoscale Interdisciplinary Research Team contract CMS-0506841.
@article{Chen_2008, title={Observation of Atomic Diffusion at Twin-Modified Grain Boundaries in Copper}, volume={321}, ISSN={1095-9203}, url={http://dx.doi.org/10.1126/science.1160777}, DOI={10.1126/science.1160777}, number={5892}, journal={Science}, publisher={American Association for the Advancement of Science (AAAS)}, author={Chen, Kuan-Chia and Wu, Wen-Wei and Liao, Chien-Neng and Chen, Lih-Juann and Tu, K. N.}, year={2008}, month=aug, pages={1066–1069} }