DOI: 10.1117/12.445293. Enhanced amorphous silicon technology for 320 x 240 microbolometer arrays with a pitch of 35 μm

Enhanced amorphous silicon technology for 320 x 240 microbolometer arrays with a pitch of 35 μm

10.1117/12.445293

Crossref proceedings-article

SPIE

SPIE Proceedings (189)

Bibliography

Mottin, E., Martin, J.-L., Ouvrier-Buffet, J.-L., Vilain, M., Bain, A., Yon, J.-J., Tissot, J.-L., & Chatard, J.-P. (2001). Enhanced amorphous silicon technology for 320 x 240 microbolometer arrays with a pitch of 35 Î¼m. Infrared Technology and Applications XXVII, 4369, 250.

Authors 8

Eric Mottin (first)
Jean-Luc Martin (additional)
Jean-Louis Ouvrier-Buffet (additional)
Michel Vilain (additional)
Astrid Bain (additional)
Jean-Jacques Yon (additional)
Jean-Luc Tissot (additional)
Jean-Pierre Chatard (additional)

References 0 Referenced 24

None

Dates

Type	When
Created	21 years, 9 months ago (Nov. 19, 2003, 10:48 a.m.)
Deposited	9 years ago (Aug. 5, 2016, 9:34 p.m.)
Indexed	2 months ago (June 19, 2025, 5:24 a.m.)
Issued	23 years, 10 months ago (Oct. 10, 2001)
Published	23 years, 10 months ago (Oct. 10, 2001)
Published Print	23 years, 10 months ago (Oct. 10, 2001)

Funders 0

None

BibTeX

@inproceedings{Mottin_2001, title={Enhanced amorphous silicon technology for 320 x 240 microbolometer arrays with a pitch of 35 μm}, volume={4369}, ISSN={0277-786X}, url={http://dx.doi.org/10.1117/12.445293}, DOI={10.1117/12.445293}, booktitle={Infrared Technology and Applications XXVII}, publisher={SPIE}, author={Mottin, Eric and Martin, Jean-Luc and Ouvrier-Buffet, Jean-Louis and Vilain, Michel and Bain, Astrid and Yon, Jean-Jacques and Tissot, Jean-Luc and Chatard, Jean-Pierre}, editor={Andresen, Bjorn F. and Fulop, Gabor F. and Strojnik, Marija}, year={2001}, month=oct, pages={250} }

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