DOI: 10.1117/12.209185. Toward a commercial gas field ion source

Toward a commercial gas field ion source

10.1117/12.209185

Crossref proceedings-article

SPIE

SPIE Proceedings (189)

Bibliography

Thompson, W. B., Armstrong, A., Etchin, S., Hill, R., Kalbitzer, S., Percival, R., Saxonis, A., & Wilbertz, C. (1995). Toward a commercial gas field ion source. Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing V, 2437, 284.

Authors 8

William B. Thompson (first)
A. Armstrong (additional)
S. Etchin (additional)
Raymond Hill (additional)
Sigfried Kalbitzer (additional)
R. Percival (additional)
A. Saxonis (additional)
Christoph Wilbertz (additional)

References 0 Referenced 2

None

Dates

Type	When
Created	20 years, 8 months ago (Dec. 30, 2004, 1:05 p.m.)
Deposited	8 years, 6 months ago (March 6, 2017, 4:16 p.m.)
Indexed	1 year ago (Sept. 6, 2024, 10:13 p.m.)
Issued	30 years, 3 months ago (May 19, 1995)
Published	30 years, 3 months ago (May 19, 1995)
Published Print	30 years, 3 months ago (May 19, 1995)

Funders 0

None

BibTeX

@inproceedings{Thompson_1995, title={Toward a commercial gas field ion source}, volume={2437}, ISSN={0277-786X}, url={http://dx.doi.org/10.1117/12.209185}, DOI={10.1117/12.209185}, booktitle={Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing V}, publisher={SPIE}, author={Thompson, William B. and Armstrong, A. and Etchin, S. and Hill, Raymond and Kalbitzer, Sigfried and Percival, R. and Saxonis, A. and Wilbertz, Christoph}, editor={Warlaumont, John M.}, year={1995}, month=may, pages={284} }

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