DOI: 10.1117/12.209151. Lithography and the future of Moore's law

Lithography and the future of Moore's law

10.1117/12.209151

Crossref proceedings-article

SPIE

SPIE Proceedings (189)

Bibliography

Moore, G. E. (1995). Lithography and the future of Mooreâs law. Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing V, 2437, 2.

Authors 1

Gordon E. Moore (first)

References 0 Referenced 38

None

Dates

Type	When
Created	20 years, 7 months ago (Dec. 30, 2004, 1:05 p.m.)
Deposited	8 years, 5 months ago (March 6, 2017, 4:17 p.m.)
Indexed	3 months, 2 weeks ago (May 8, 2025, 3:23 a.m.)
Issued	30 years, 3 months ago (May 19, 1995)
Published	30 years, 3 months ago (May 19, 1995)
Published Print	30 years, 3 months ago (May 19, 1995)

Funders 0

None

BibTeX

@inproceedings{Moore_1995, title={Lithography and the future of Moore’s law}, volume={2437}, ISSN={0277-786X}, url={http://dx.doi.org/10.1117/12.209151}, DOI={10.1117/12.209151}, booktitle={Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing V}, publisher={SPIE}, author={Moore, Gordon E.}, editor={Warlaumont, John M.}, year={1995}, month=may, pages={2} }

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