DOI: 10.1117/12.20075. <title>On-line state and model parameter identification of the positive optical photoresist development process</title>

<title>On-line state and model parameter identification of the positive optical photoresist development process</title>

10.1117/12.20075

Crossref proceedings-article

SPIE

SPIE Proceedings (189)

Bibliography

Carroll, T. A., & Ramirez, W. F. (1990). <title>On-line state and model parameter identification of the positive optical photoresist development process</title> Integrated Circuit Metrology, Inspection, and Process Control IV, 1261, 390â401.

Authors 2

Thomas A. Carroll (first)
W. Fred Ramirez (additional)

References 0 Referenced 1

None

Dates

Type	When
Created	20 years, 6 months ago (Feb. 15, 2005, 1:22 p.m.)
Deposited	12 years, 5 months ago (March 13, 2013, 11:29 a.m.)
Indexed	1 year ago (Sept. 4, 2024, 3:36 p.m.)
Issued	35 years, 3 months ago (June 1, 1990)
Published	35 years, 3 months ago (June 1, 1990)
Published Print	35 years, 3 months ago (June 1, 1990)

Funders 0

None

BibTeX

@inproceedings{Carroll_1990, title={<title>On-line state and model parameter identification of the positive optical photoresist development process</title>}, volume={1261}, ISSN={0277-786X}, url={http://dx.doi.org/10.1117/12.20075}, DOI={10.1117/12.20075}, booktitle={Integrated Circuit Metrology, Inspection, and Process Control IV}, publisher={SPIE}, author={Carroll, Thomas A. and Ramirez, W. Fred}, editor={Arnold, William H.}, year={1990}, month=jun, pages={390–401} }

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