Abstract
A focused ion beam (FIB) has been actively applied for preparation of about 0.1-μm-thick specimens for transmission electron microscopes (TEMs). For device failure analyses, however, it is mostly difficult to prepare the exact-point TEM specimens. The reason is that the failures are mostly beneath the surface and their exact locations are unknown. Then, even step-by-step FIB cross sectioning may sputter away the failures in the TEM specimen preparation. In the present study, we review two proposals for exact-point TEM microscopy using FIB specimen-preparation technique: (1) high-voltage scanning electron microscopes (HV-SEMs) imaging in TEM and (2) energy filtering TEM (EF-TEM) imaging. The HV-SEM imaging provides information on not only the sample surface but also the inner structure up to about 1 μm deep. The EF-TEM imaging is applicable even for 0.5-μm-thick specimens at 100 kV in the accelerating voltage, in contrast with about 0.1-μm-thick specimens for conventional TEM imaging. Preliminary experiments have supported that either proposal presumably improves the yield of the exact-point TEM inspection.
Bibliography
Ishitani, T., Taniguchi, Y., Isakozawa, S., Koike, H., Yaguchi, T., Matsumoto, H., & Kamino, T. (1998). Proposals for exact-point transmission-electron microscopy using focused ion beam specimen-preparation technique. Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena, 16(4), 2532â2537.
References
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Dates
Type | When |
---|---|
Created | 23 years ago (July 27, 2002, 5:09 a.m.) |
Deposited | 2 years, 1 month ago (July 15, 2023, 11:39 p.m.) |
Indexed | 2 years, 1 month ago (July 16, 2023, 12:17 a.m.) |
Issued | 27 years, 1 month ago (July 1, 1998) |
Published | 27 years, 1 month ago (July 1, 1998) |
Published Print | 27 years, 1 month ago (July 1, 1998) |
@article{Ishitani_1998, title={Proposals for exact-point transmission-electron microscopy using focused ion beam specimen-preparation technique}, volume={16}, ISSN={1520-8567}, url={http://dx.doi.org/10.1116/1.590204}, DOI={10.1116/1.590204}, number={4}, journal={Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena}, publisher={American Vacuum Society}, author={Ishitani, T. and Taniguchi, Y. and Isakozawa, S. and Koike, H. and Yaguchi, T. and Matsumoto, H. and Kamino, T.}, year={1998}, month=jul, pages={2532–2537} }