Crossref journal-article
American Vacuum Society
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena (20)
Abstract

The first high-resolution study of the optical emission from nitrogen plasmas produced by an ASTeX compact electron cyclotron resonance (ECR) microwave plasma source is reported. The spectroscopic results clearly show that the ECR plasma source generates an appreciable flux of nitrogen atoms, as indicated by strong atomic emission lines in the near-infrared spectral region, in addition to various species of molecular nitrogen.

Bibliography

Vaudo, R. P., Cook, J. W., & Schetzina, J. F. (1994). Atomic nitrogen production in a molecular-beam epitaxy compatible electron cyclotron resonance plasma source. Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena, 12(2), 1232–1235.

Authors 3
  1. R. P. Vaudo (first)
  2. J. W. Cook (additional)
  3. J. F. Schetzina (additional)
References 0 Referenced 65

None

Dates
Type When
Created 23 years, 1 month ago (July 27, 2002, 5:27 a.m.)
Deposited 2 years, 1 month ago (July 16, 2023, 6:10 a.m.)
Indexed 1 year, 7 months ago (Feb. 7, 2024, 7:43 p.m.)
Issued 31 years, 6 months ago (March 1, 1994)
Published 31 years, 6 months ago (March 1, 1994)
Published Print 31 years, 6 months ago (March 1, 1994)
Funders 0

None

@article{Vaudo_1994, title={Atomic nitrogen production in a molecular-beam epitaxy compatible electron cyclotron resonance plasma source}, volume={12}, ISSN={1520-8567}, url={http://dx.doi.org/10.1116/1.587052}, DOI={10.1116/1.587052}, number={2}, journal={Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena}, publisher={American Vacuum Society}, author={Vaudo, R. P. and Cook, J. W. and Schetzina, J. F.}, year={1994}, month=mar, pages={1232–1235} }