DOI: 10.1116/1.585969. <i>In situ</i> distortion measurement of an ion projector with 5× ion-optical reduction

In situ distortion measurement of an ion projector with 5× ion-optical reduction

10.1116/1.585969

Crossref journal-article

American Vacuum Society

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena (20)

Abstract

In situ distortion measurements of an ion projector with 5× ion-optical reduction were performed. At optimum conditions the measured minimum distortion was less than 0.15 μm within an exposure field of 8 mm×8 mm. This result is in excellent agreement with fifth order ion-optical calculations.

Bibliography

Stengl, G., BÃ¶sch, G., Chalupka, A., Fegerl, J., Fischer, R., Lammer, G., LÃ¶schner, H., Malek, L., Nowak, R., Traher, C., Wolf, P., & Vonach, H. (1992). In situ distortion measurement of an ion projector with 5Ã ion-optical reduction. Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena, 10(6), 2838â2841.

Authors 12

G. Stengl (first)
G. Bösch (additional)
A. Chalupka (additional)
J. Fegerl (additional)
R. Fischer (additional)
G. Lammer (additional)
H. Löschner (additional)
L. Malek (additional)
R. Nowak (additional)
C. Traher (additional)
P. Wolf (additional)
H. Vonach (additional)

References 0 Referenced 8

None

Dates

Type	When
Created	23 years, 1 month ago (July 27, 2002, 5:26 a.m.)
Deposited	2 years ago (Aug. 8, 2023, 11:56 p.m.)
Indexed	1 year, 6 months ago (Feb. 10, 2024, 11 a.m.)
Issued	32 years, 10 months ago (Nov. 1, 1992)
Published	32 years, 10 months ago (Nov. 1, 1992)
Published Print	32 years, 10 months ago (Nov. 1, 1992)

Funders 0

None

BibTeX

@article{Stengl_1992, title={In situ distortion measurement of an ion projector with 5× ion-optical reduction}, volume={10}, ISSN={1520-8567}, url={http://dx.doi.org/10.1116/1.585969}, DOI={10.1116/1.585969}, number={6}, journal={Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena}, publisher={American Vacuum Society}, author={Stengl, G. and Bösch, G. and Chalupka, A. and Fegerl, J. and Fischer, R. and Lammer, G. and Löschner, H. and Malek, L. and Nowak, R. and Traher, C. and Wolf, P. and Vonach, H.}, year={1992}, month=nov, pages={2838–2841} }

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