DOI: 10.1116/1.584902. Rapid thermal processing systems: A review with emphasis on temperature control

Rapid thermal processing systems: A review with emphasis on temperature control

10.1116/1.584902

Crossref journal-article

American Vacuum Society

Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena (20)

Abstract

This paper highlights the basic principles of rapid thermal processing (RTP) systems and the important areas of concern. The basic system characteristics, the fundamental physics involved, and the techniques for temperature measurement and control are extensively reviewed. We summarize the options currently available for 15 RTP equipment manufacturers and point out the latest developments in RTP system design and temperature measurement. Some novel options for temperature control (optical, fiber optical, and photoacoustic) are included.

Bibliography

Roozeboom, F., & Parekh, N. (1990). Rapid thermal processing systems: A review with emphasis on temperature control. Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena, 8(6), 1249â1259.

Authors 2

Fred Roozeboom (first)
N. Parekh (additional)

References 0 Referenced 89

None

Dates

Type	When
Created	23 years, 1 month ago (July 27, 2002, 5:24 a.m.)
Deposited	2 years, 1 month ago (July 6, 2023, 10:31 p.m.)
Indexed	1 month ago (July 30, 2025, 10:47 a.m.)
Issued	34 years, 10 months ago (Nov. 1, 1990)
Published	34 years, 10 months ago (Nov. 1, 1990)
Published Print	34 years, 10 months ago (Nov. 1, 1990)

Funders 0

None

BibTeX

@article{Roozeboom_1990, title={Rapid thermal processing systems: A review with emphasis on temperature control}, volume={8}, ISSN={2327-9877}, url={http://dx.doi.org/10.1116/1.584902}, DOI={10.1116/1.584902}, number={6}, journal={Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena}, publisher={American Vacuum Society}, author={Roozeboom, Fred and Parekh, N.}, year={1990}, month=nov, pages={1249–1259} }

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