DOI: 10.1116/1.584652. Direct electron-beam patterning for nanolithography

Direct electron-beam patterning for nanolithography

10.1116/1.584652

Crossref journal-article

American Vacuum Society

Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena (20)

Abstract

An experimental high resolution e-beam system has been developed for direct deposition of microstructures with feature size ≂0.1 μm and below. This system is used to study various aspects of high resolution direct e-beam deposition process, i.e., physical factors which govern the resolution of the process, film characteristics and properties, nucleation of film growth, and pattern aspect ratio capability. For direct e-beam deposition of Au, using organometallic complexes, features with minimum linewidth of ≂30 nm and center-to-center feature spacing as small as 50 nm have been achieved. These represent the finest and densest features yet fabricated using the organometallic Au complexes. Potential applications of the technique for high resolution mask repair, fabrication of two- or three-dimensional nanometer scale devices, sensors and transducers for a variety of fundamental physics studies will be discussed.

Bibliography

Lee, K. L., & Hatzakis, M. (1989). Direct electron-beam patterning for nanolithography. Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena, 7(6), 1941â1946.

Authors 2

K. L. Lee (first)
M. Hatzakis (additional)

References 0 Referenced 51

None

Dates

Type	When
Created	23 years, 1 month ago (July 27, 2002, 5:16 a.m.)
Deposited	2 years ago (Aug. 7, 2023, 4:33 p.m.)
Indexed	11 months, 1 week ago (Sept. 20, 2024, 11:34 a.m.)
Issued	35 years, 9 months ago (Nov. 1, 1989)
Published	35 years, 9 months ago (Nov. 1, 1989)
Published Print	35 years, 9 months ago (Nov. 1, 1989)

Funders 0

None

BibTeX

@article{Lee_1989, title={Direct electron-beam patterning for nanolithography}, volume={7}, ISSN={2327-9877}, url={http://dx.doi.org/10.1116/1.584652}, DOI={10.1116/1.584652}, number={6}, journal={Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena}, publisher={American Vacuum Society}, author={Lee, K. L. and Hatzakis, M.}, year={1989}, month=nov, pages={1941–1946} }

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