Crossref journal-article
American Vacuum Society
Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena (20)
Abstract

We have made a computer simulation of the target current density in our single-lens focused ion beam column. This column images at unity magnification the virtual source of a liquid metal ion source. We simulate the nonlaminar properties of the emitted ions with a two-dimensional function f (r,r′) that represents the phase space density distribution of the beam, where r and r′(dr/dz) are the radial position and slope, respectively, in the aperture plane. This analysis further shows how f (r,r′) can be described in terms of the experimentally measured target current density profile.

Bibliography

Ward, J. W., Utlaut, M. W., & Kubena, R. L. (1987). Computer simulation of current density profiles in focused ion beams. Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena, 5(1), 169–174.

Authors 3
  1. J. W. Ward (first)
  2. M. W. Utlaut (additional)
  3. R. L. Kubena (additional)
References 0 Referenced 22

None

Dates
Type When
Created 23 years, 1 month ago (July 27, 2002, 5:24 a.m.)
Deposited 2 years, 1 month ago (July 7, 2023, 12:23 a.m.)
Indexed 11 months, 2 weeks ago (Sept. 20, 2024, 11:34 a.m.)
Issued 38 years, 8 months ago (Jan. 1, 1987)
Published 38 years, 8 months ago (Jan. 1, 1987)
Published Print 38 years, 8 months ago (Jan. 1, 1987)
Funders 0

None

@article{Ward_1987, title={Computer simulation of current density profiles in focused ion beams}, volume={5}, ISSN={2327-9877}, url={http://dx.doi.org/10.1116/1.583856}, DOI={10.1116/1.583856}, number={1}, journal={Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena}, publisher={American Vacuum Society}, author={Ward, J. W. and Utlaut, M. W. and Kubena, R. L.}, year={1987}, month=jan, pages={169–174} }