DOI: 10.1116/1.582646. 100 keV focused ion beam system with a <i>E</i>×<i>B</i> mass filter for maskless ion implantation

100 keV focused ion beam system with a E×B mass filter for maskless ion implantation

10.1116/1.582646

Crossref journal-article

American Vacuum Society

Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena (20)

Abstract

Various liquid metal alloy ion sources and a 100 keV mass separated focused ion beam system have been fabricated and their basic characteristics have been measured. These are mass spectra, energy spread and angular current intensity for ion sources, and focusing characteristics of the system. It was observed that Be–Si–Au ternary alloy ion sources produce doubly charged Be and Si ions and the importance of these ion sources is demonstrated by fabricating a GaAs JFET using a maskless ion implantation technique and by PMMA resist exposure.

Bibliography

Shiokawa, T., Kim, P. H., Toyoda, K., Namba, S., Matsui, T., & Gamo, K. (1983). 100 keV focused ion beam system with a EÃB mass filter for maskless ion implantation. Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena, 1(4), 1117â1120.

Authors 6

Takao Shiokawa (first)
Pil Hyon Kim (additional)
Koichi Toyoda (additional)
Susumu Namba (additional)
Takao Matsui (additional)
Kenji Gamo (additional)

References 0 Referenced 33

None

Dates

Type	When
Created	23 years ago (July 27, 2002, 5:22 a.m.)
Deposited	2 years, 1 month ago (July 6, 2023, 11:21 p.m.)
Indexed	1 year, 3 months ago (May 19, 2024, 1:04 a.m.)
Issued	41 years, 10 months ago (Oct. 1, 1983)
Published	41 years, 10 months ago (Oct. 1, 1983)
Published Print	41 years, 10 months ago (Oct. 1, 1983)

Funders 0

None

BibTeX

@article{Shiokawa_1983, title={100 keV focused ion beam system with a E×B mass filter for maskless ion implantation}, volume={1}, ISSN={2327-9877}, url={http://dx.doi.org/10.1116/1.582646}, DOI={10.1116/1.582646}, number={4}, journal={Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena}, publisher={American Vacuum Society}, author={Shiokawa, Takao and Kim, Pil Hyon and Toyoda, Koichi and Namba, Susumu and Matsui, Takao and Gamo, Kenji}, year={1983}, month=oct, pages={1117–1120} }

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