DOI: 10.1116/1.575980. Infrared spectroscopy of Si(111) and Si(100) surfaces after HF treatment: Hydrogen termination and surface morphology

Infrared spectroscopy of Si(111) and Si(100) surfaces after HF treatment: Hydrogen termination and surface morphology

10.1116/1.575980

Crossref journal-article

American Vacuum Society

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films (20)

Bibliography

Chabal, Y. J., Higashi, G. S., Raghavachari, K., & Burrows, V. A. (1989). Infrared spectroscopy of Si(111) and Si(100) surfaces after HF treatment: Hydrogen termination and surface morphology. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 7(3), 2104â2109.

Authors 4

Y. J. Chabal (first)
G. S. Higashi (additional)
K. Raghavachari (additional)
V. A. Burrows (additional)

References 0 Referenced 595

None

Dates

Type	When
Created	23 years, 1 month ago (July 27, 2002, 5:15 a.m.)
Deposited	2 years, 4 months ago (April 20, 2023, 7:58 p.m.)
Indexed	2 weeks, 1 day ago (Aug. 12, 2025, 6:30 p.m.)
Issued	36 years, 3 months ago (May 1, 1989)
Published	36 years, 3 months ago (May 1, 1989)
Published Print	36 years, 3 months ago (May 1, 1989)

Funders 0

None

BibTeX

@article{Chabal_1989, title={Infrared spectroscopy of Si(111) and Si(100) surfaces after HF treatment: Hydrogen termination and surface morphology}, volume={7}, ISSN={1520-8559}, url={http://dx.doi.org/10.1116/1.575980}, DOI={10.1116/1.575980}, number={3}, journal={Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films}, publisher={American Vacuum Society}, author={Chabal, Y. J. and Higashi, G. S. and Raghavachari, K. and Burrows, V. A.}, year={1989}, month=may, pages={2104–2109} }

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