DOI: 10.1116/1.575815. Electron cyclotron resonance microwave discharges for etching and thin-film deposition

Electron cyclotron resonance microwave discharges for etching and thin-film deposition

10.1116/1.575815

Crossref journal-article

American Vacuum Society

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films (20)

Abstract

A recent, important development in low-pressure and low-temperature plasma processing is the microwave electron cyclotron resonance (ECR) discharge. Its lack of electrodes and its ability to create high densities of charged and excited species at low pressures (≲10−4 Torr) make it an attractive processing discharge in etching and thin-film deposition applications. This article reviews the basic physics of ECR discharges and reviews the associated microwave system and applicator technologies. Waveguide and cavity ECR applicators are compared and are described in detail. Several ECR plasma processing reactors are also described. Methods of processing large surfaces are outlined, and typical experimentally measured ECR discharge characteristics are presented.

Bibliography

Asmussen, J. (1989). Electron cyclotron resonance microwave discharges for etching and thin-film deposition. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 7(3), 883â893.

Authors 1

Jes Asmussen (first)

References 0 Referenced 332

None

Dates

Type	When
Created	23 years ago (July 27, 2002, 5:19 a.m.)
Deposited	2 years, 2 months ago (June 20, 2023, 12:57 p.m.)
Indexed	1 month, 2 weeks ago (July 4, 2025, 4:26 a.m.)
Issued	36 years, 3 months ago (May 1, 1989)
Published	36 years, 3 months ago (May 1, 1989)
Published Print	36 years, 3 months ago (May 1, 1989)

Funders 0

None

BibTeX

@article{Asmussen_1989, title={Electron cyclotron resonance microwave discharges for etching and thin-film deposition}, volume={7}, ISSN={1520-8559}, url={http://dx.doi.org/10.1116/1.575815}, DOI={10.1116/1.575815}, number={3}, journal={Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films}, publisher={American Vacuum Society}, author={Asmussen, Jes}, year={1989}, month=may, pages={883–893} }

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