DOI: 10.1116/1.571412. X-ray standing wave analysis for bromine chemisorbed on silicon

X-ray standing wave analysis for bromine chemisorbed on silicon

10.1116/1.571412

Crossref journal-article

American Vacuum Society

Journal of Vacuum Science and Technology (20)

Abstract

X-ray standing wave measurements on single crystals of silicon are used to determine the coverage and position of chemisorbed bromine. Detailed analysis of the position information leads to the conclusion that silicon surface atoms bonded to adsorbed bromine atoms are in extrapolated bulk-line positions. Direct measurement of the desorption of correlated bromine in air demonstrates the high stability of the Br/Si surface interface.

Bibliography

Bedzyk, M. J., Gibson, W. M., & Golovchenko, J. A. (1982). X-ray standing wave analysis for bromine chemisorbed on silicon. Journal of Vacuum Science and Technology, 20(3), 634â637.

Authors 3

M. J. Bedzyk (first)
W. M. Gibson (additional)
J. A. Golovchenko (additional)

References 0 Referenced 43

None

Dates

Type	When
Created	23 years, 1 month ago (July 27, 2002, 5:31 a.m.)
Deposited	2 years, 2 months ago (June 23, 2023, 11:33 a.m.)
Indexed	1 year, 7 months ago (Feb. 4, 2024, 11:42 a.m.)
Issued	43 years, 6 months ago (March 1, 1982)
Published	43 years, 6 months ago (March 1, 1982)
Published Print	43 years, 6 months ago (March 1, 1982)

Funders 0

None

BibTeX

@article{Bedzyk_1982, title={X-ray standing wave analysis for bromine chemisorbed on silicon}, volume={20}, ISSN={0022-5355}, url={http://dx.doi.org/10.1116/1.571412}, DOI={10.1116/1.571412}, number={3}, journal={Journal of Vacuum Science and Technology}, publisher={American Vacuum Society}, author={Bedzyk, M. J. and Gibson, W. M. and Golovchenko, J. A.}, year={1982}, month=mar, pages={634–637} }

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