DOI: 10.1116/1.568474. Ionized-cluster beam deposition

10.1116/1.568474

Crossref journal-article

American Vacuum Society

Journal of Vacuum Science and Technology (20)

Abstract

We describe a form of deposition in which material is vaporized in a crucible and the vapor then ejected through a fine nozzle at the focus of an electron beam in a high vacuum. The vapor, on emerging from the nozzle, is partially condensed into clusters that are ionized by electron bombardment and then accelerated onto the substrate. The deposited films show good adhesion and large crystallite size. Examples include the deposition of Cu onto glass, Si onto Si, and ZnS onto NaCl.

Bibliography

Takagi, T., Yamada, I., & Sasaki, A. (1975). Ionized-cluster beam deposition. Journal of Vacuum Science and Technology, 12(6), 1128â1134.

Authors 3

T. Takagi (first)
I. Yamada (additional)
A. Sasaki (additional)

References 0 Referenced 103

None

Dates

Type	When
Created	23 years ago (July 27, 2002, 5:33 a.m.)
Deposited	2 years, 1 month ago (June 28, 2023, 10:22 p.m.)
Indexed	1 year ago (Aug. 2, 2024, 5:04 a.m.)
Issued	49 years, 9 months ago (Nov. 1, 1975)
Published	49 years, 9 months ago (Nov. 1, 1975)
Published Print	49 years, 9 months ago (Nov. 1, 1975)

Funders 0

None

BibTeX

@article{Takagi_1975, title={Ionized-cluster beam deposition}, volume={12}, ISSN={0022-5355}, url={http://dx.doi.org/10.1116/1.568474}, DOI={10.1116/1.568474}, number={6}, journal={Journal of Vacuum Science and Technology}, publisher={American Vacuum Society}, author={Takagi, T. and Yamada, I. and Sasaki, A.}, year={1975}, month=nov, pages={1128–1134} }

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