Abstract
ALIS Corporation has developed a new helium ion microscope which has many advantages over both traditional scanning electron microscopes (SEMs) and focused ion beams (FIBs). This new technology is expected to produce an ultimate focused spot size of 0.25nm. This high resolution is attributed to the high source brightness (B>4×109A∕cm2sr), low energy spread (ΔE∕E∼2×10−5), and small diffraction effects (λ∼80fm). The interaction of helium ions with matter offers several valuable contrast mechanisms and a surface interaction volume which is much smaller than a SEM or conventional FIB.
References
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Dates
Type | When |
---|---|
Created | 18 years, 8 months ago (Dec. 18, 2006, 7:34 p.m.) |
Deposited | 2 years, 1 month ago (July 9, 2023, 5:37 p.m.) |
Indexed | 2 weeks ago (Aug. 7, 2025, 4:47 p.m.) |
Issued | 18 years, 9 months ago (Nov. 1, 2006) |
Published | 18 years, 9 months ago (Nov. 1, 2006) |
Published Online | 18 years, 8 months ago (Nov. 30, 2006) |
Published Print | 18 years, 9 months ago (Nov. 1, 2006) |
@article{Ward_2006, title={Helium ion microscope: A new tool for nanoscale microscopy and metrology}, volume={24}, ISSN={1520-8567}, url={http://dx.doi.org/10.1116/1.2357967}, DOI={10.1116/1.2357967}, number={6}, journal={Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena}, publisher={American Vacuum Society}, author={Ward, B. W. and Notte, John A. and Economou, N. P.}, year={2006}, month=nov, pages={2871–2874} }