Abstract
The influence of film thickness on the material properties of aluminum nitride (AlN) thin films deposited on Pt(111) electrodes has been investigated experimentally by means of x-ray diffraction, dielectric response, atomic force microscopy, interferometry measurement of effective d33, and residual stress measurement. The thickness was varied between 35 nm and 2 μm. Full width at mid-height of the rocking curve decreased from 2.60 to 1.14°, rms roughness increased from 3.8 to 18.6 Å, the effective d33, namely d33,f, from 2.75 to 5.15 pm/V. The permittivity εAlN was stable at 10.2, whereas the dielectric losses decreased from 1% to 0.1%. The breakdown electric field under dc voltages varied between 4.0 and 5.5 MV/cm.
References
28
Referenced
275
10.1116/1.1399320
/ J. Vac. Sci. Technol. A (2001){'issue': '1–2', 'key': '2023070817085366900_r2', 'first-page': '256', 'volume': '354', 'year': '1999', 'journal-title': 'Thin Solid Films'}
/ Thin Solid Films (1999){'key': '2023070817085366900_r3', 'first-page': '704', 'volume': '121', 'year': '1999', 'journal-title': 'Surf. Coat. Technol.'}
/ Surf. Coat. Technol. (1999)10.1063/1.1359162
/ J. Appl. Phys. (2001){'issue': '1–4', 'key': '2023070817085366900_r5', 'first-page': '671', 'volume': '224', 'year': '1999', 'journal-title': 'Ferroelectrics'}
/ Ferroelectrics (1999){'issue': '4A', 'key': '2023070817085366900_r6', 'first-page': '1594', 'volume': '42', 'year': '2003', 'journal-title': 'Jpn. J. Appl. Phys., Part 1'}
/ Jpn. J. Appl. Phys., Part 1 (2003)10.1007/s11664-003-0192-1
/ J. Electron. Mater. (2003){'issue': '5A', 'key': '2023070817085366900_r8', 'first-page': '2829', 'volume': '42', 'year': '2003', 'journal-title': 'Jpn. J. Appl. Phys., Part 1'}
/ Jpn. J. Appl. Phys., Part 1 (2003){'issue': '7A', 'key': '2023070817085366900_r9', 'first-page': '4620', 'volume': '41', 'year': '2002', 'journal-title': 'Jpn. J. Appl. Phys., Part 1'}
/ Jpn. J. Appl. Phys., Part 1 (2002)10.1116/1.581321
/ J. Vac. Sci. Technol. A (1998){'key': '2023070817085366900_r11', 'first-page': '634', 'volume': 'SU-32', 'year': '1985', 'journal-title': 'IEEE Trans. Sonics Ultrason.'}
/ IEEE Trans. Sonics Ultrason. (1985)10.1063/1.124055
/ Appl. Phys. Lett. (1999)10.1002/1521-396X(200212)194:2<506::AID-PSSA506>3.0.CO;2-N
/ Phys. Status Solidi A (2002)10.1007/s00339-002-2022-3
/ Appl. Phys. A: Mater. Sci. Process. (2003)10.1103/PhysRevB.66.155439
/ Phys. Rev. B (2002){'issue': '12B', 'key': '2023070817085366900_r16', 'first-page': 'L1452', 'volume': '41', 'year': '2002', 'journal-title': 'Jpn. J. Appl. Phys.'}
/ Jpn. J. Appl. Phys. (2002)10.1063/1.1505977
/ J. Appl. Phys. (2002)10.1116/1.1521961
/ J. Vac. Sci. Technol. A (2003){'key': '2023070817085366900_r19', 'first-page': '2005', 'volume': '1–3', 'year': '2003', 'journal-title': 'IEEE MTT-S Int. Microwave Symp. Dig.'}
/ IEEE MTT-S Int. Microwave Symp. Dig. (2003){'key': '2023070817085366900_r20', 'first-page': '311', 'volume': '1–2', 'year': '2002', 'journal-title': 'IEEE Ultrason. Symp. Proc.'}
/ IEEE Ultrason. Symp. Proc. (2002){'key': '2023070817085366900_r21', 'first-page': '4052', 'volume': '32', 'year': '2993', 'journal-title': 'Jpn. J. Appl. Phys.'}
/ Jpn. J. Appl. Phys. (2993)10.1107/S0021889803003145
/ J. Appl. Crystallogr. (2003)10.1088/1367-2630/4/1/364
/ New J. Phys. (2002)10.1063/1.1147000
/ Rev. Sci. Instrum. (1996)10.1063/1.357693
/ J. Appl. Phys. (1994){'key': '2023070817085366900_r26', 'first-page': '5360', 'volume': '88', 'year': '1994', 'journal-title': 'J. Appl. Phys.'}
/ J. Appl. Phys. (1994)10.1016/S0254-0584(02)00252-3
/ Mater. Chem. Phys. (2003){'key': '2023070817085366900_r28'}
Dates
Type | When |
---|---|
Created | 21 years, 5 months ago (Feb. 26, 2004, 1:31 p.m.) |
Deposited | 1 year, 7 months ago (Jan. 12, 2024, 9:55 a.m.) |
Indexed | 1 day, 22 hours ago (Aug. 22, 2025, 12:46 a.m.) |
Issued | 21 years, 6 months ago (Feb. 12, 2004) |
Published | 21 years, 6 months ago (Feb. 12, 2004) |
Published Online | 21 years, 6 months ago (Feb. 12, 2004) |
Published Print | 21 years, 5 months ago (March 1, 2004) |
@article{Martin_2004, title={Thickness dependence of the properties of highlyc-axis textured AlN thin films}, volume={22}, ISSN={1520-8559}, url={http://dx.doi.org/10.1116/1.1649343}, DOI={10.1116/1.1649343}, number={2}, journal={Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films}, publisher={American Vacuum Society}, author={Martin, F. and Muralt, P. and Dubois, M.-A. and Pezous, A.}, year={2004}, month=feb, pages={361–365} }