DOI: 10.1116/1.1629711. Nanometer-period gratings in hydrogen silsesquioxane fabricated by electron beam lithography

Nanometer-period gratings in hydrogen silsesquioxane fabricated by electron beam lithography

10.1116/1.1629711

Crossref journal-article

American Vacuum Society

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena (20)

Abstract

Hydrogen silsesquioxane (HSQ) is a high-resolution negative-tone inorganic resist for electron beam lithography. Investigations on the smoothness of the surfaces of thin films (less than 100 nm thick) have been conducted for nanolithography applications. It is demonstrated that films at thicknesses down to 25 nm have very low rms roughness and are defect free. Using 50 kV electron beam lithography, we demonstrate the achievement of isolated 6-nm-wide lines and 27 nm period gratings in 30 nm HSQ films on silicon substrates. These results are superior to those achieved with poly(methylmethacrylate) resist and demonstrates the versatility of HSQ for nanolithography.

Bibliography

Word, M. J., Adesida, I., & Berger, P. R. (2003). Nanometer-period gratings in hydrogen silsesquioxane fabricated by electron beam lithography. Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena, 21(6), L12âL15.

Authors 3

Michael J. Word (first)
Ilesanmi Adesida (additional)
Paul R. Berger (additional)

References 15 Referenced 74

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10.1063/1.109798 / Appl. Phys. Lett. (1993)
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10.1016/S0167-9317(98)00047-1 / Microelectron. Eng. (1998)
10.1016/S0167-9317(02)00468-9 / Microelectron. Eng. (2002)
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{'key': '2023070922284850100_r9', 'first-page': '2709', 'volume': '19', 'year': '2001', 'journal-title': 'J. Vac. Sci. Technol. B'} / J. Vac. Sci. Technol. B (2001)
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10.1016/S0167-9317(03)00187-4 / Microelectron. Eng. (2003)
10.1126/science.1081940 / Science (2003)

Dates

Type	When
Created	21 years, 8 months ago (Dec. 19, 2003, 6:05 p.m.)
Deposited	2 years, 1 month ago (July 9, 2023, 6:28 p.m.)
Indexed	45 minutes ago (Aug. 23, 2025, 8:23 p.m.)
Issued	21 years, 9 months ago (Nov. 1, 2003)
Published	21 years, 9 months ago (Nov. 1, 2003)
Published Online	21 years, 9 months ago (Nov. 18, 2003)
Published Print	21 years, 9 months ago (Nov. 1, 2003)

Funders 0

None

BibTeX

@article{Word_2003, title={Nanometer-period gratings in hydrogen silsesquioxane fabricated by electron beam lithography}, volume={21}, ISSN={1520-8567}, url={http://dx.doi.org/10.1116/1.1629711}, DOI={10.1116/1.1629711}, number={6}, journal={Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena}, publisher={American Vacuum Society}, author={Word, Michael J. and Adesida, Ilesanmi and Berger, Paul R.}, year={2003}, month=nov, pages={L12–L15} }

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