DOI: 10.1116/1.1566789. Influence of energetic bombardment on stress, resistivity, and microstructure of indium tin oxide films grown by radio frequency magnetron sputtering on flexible polyester substrates

Influence of energetic bombardment on stress, resistivity, and microstructure of indium tin oxide films grown by radio frequency magnetron sputtering on flexible polyester substrates

10.1116/1.1566789

Crossref journal-article

American Vacuum Society

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films (20)

Abstract

Using rf magnetron sputtering, we have identified conditions for growing indium tin oxide (ITO) thin films at room temperature that simultaneously exhibit low resistivity (∼3×10−4 Ω cm), high optical transparency (&gt;80%), and near-zero stress on polyester substrates. From transport measurements, we deduced that Sn donor atoms had little effect on electrical conduction in ITO films. We further concluded from an analysis of sputtered ions and atoms that bombardment by energetic (&gt;35 eV) negative oxygen ions caused high stress (∼1 GPa) in films grown at lower (6 mTorr) pressure. We further concluded that bombardment by lower-energy (1–2 eV) sputtered oxygen species at the growing film surface was likely responsible for the dependence of ITO crystallization and microstructure on oxygen partial pressure during deposition.

Bibliography

Carcia, P. F., McLean, R. S., Reilly, M. H., Li, Z. G., Pillione, L. J., & Messier, R. F. (2003). Influence of energetic bombardment on stress, resistivity, and microstructure of indium tin oxide films grown by radio frequency magnetron sputtering on flexible polyester substrates. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 21(3), 745â751.

Authors 6

P. F. Carcia (first)
R. S. McLean (additional)
M. H. Reilly (additional)
Z. G. Li (additional)
L. J. Pillione (additional)
R. F. Messier (additional)

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Dates

Type	When
Created	22 years, 4 months ago (May 1, 2003, 6:02 p.m.)
Deposited	2 years, 2 months ago (June 28, 2023, 2:04 p.m.)
Indexed	1 month, 1 week ago (July 24, 2025, 8:07 a.m.)
Issued	22 years, 4 months ago (April 25, 2003)
Published	22 years, 4 months ago (April 25, 2003)
Published Online	22 years, 4 months ago (April 25, 2003)
Published Print	22 years, 4 months ago (May 1, 2003)

Funders 0

None

BibTeX

@article{Carcia_2003, title={Influence of energetic bombardment on stress, resistivity, and microstructure of indium tin oxide films grown by radio frequency magnetron sputtering on flexible polyester substrates}, volume={21}, ISSN={1520-8559}, url={http://dx.doi.org/10.1116/1.1566789}, DOI={10.1116/1.1566789}, number={3}, journal={Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films}, publisher={American Vacuum Society}, author={Carcia, P. F. and McLean, R. S. and Reilly, M. H. and Li, Z. G. and Pillione, L. J. and Messier, R. F.}, year={2003}, month=apr, pages={745–751} }

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