Crossref journal-article
American Vacuum Society
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena (20)
Abstract

The beam brightness of a multicusp-plasma ion source has been substantially improved by optimizing the source configuration and extractor geometry. The current density of a 2 keV He+ beam extracted from a 7.5-cm-diameter source operating at 2.5 kW rf power is ∼100 mA/cm2, which is ∼10 times larger than that of a beam extracted from a 5-cm-diameter source operating at 1 kW rf power. A smaller focused beam spot size is achieved with a counter-bored extractor instead of a conventional (“through-hole”) extractor, resulting another order of magnitude improvement in beam current density. Measured beam brightness can be as high as 440 A/cm2Sr, which represents a 30 times improvement over prior work.

Bibliography

Ji, Q., Jiang, X., King, T.-J., Leung, K.-N., Standiford, K., & Wilde, S. B. (2002). Improvement in brightness of multicusp-plasma ion source. Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena, 20(6), 2717–2720.

Authors 6
  1. Q. Ji (first)
  2. X. Jiang (additional)
  3. T.-J. King (additional)
  4. K.-N. Leung (additional)
  5. K. Standiford (additional)
  6. S. B. Wilde (additional)
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Dates
Type When
Created 22 years, 8 months ago (Dec. 12, 2002, 11:39 a.m.)
Deposited 2 years ago (Aug. 9, 2023, 2:49 a.m.)
Indexed 1 month, 1 week ago (July 16, 2025, 8:53 a.m.)
Issued 22 years, 9 months ago (Nov. 1, 2002)
Published 22 years, 9 months ago (Nov. 1, 2002)
Published Online 22 years, 8 months ago (Dec. 9, 2002)
Published Print 22 years, 9 months ago (Nov. 1, 2002)
Funders 0

None

@article{Ji_2002, title={Improvement in brightness of multicusp-plasma ion source}, volume={20}, ISSN={1520-8567}, url={http://dx.doi.org/10.1116/1.1526694}, DOI={10.1116/1.1526694}, number={6}, journal={Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena}, publisher={American Vacuum Society}, author={Ji, Q. and Jiang, X. and King, T.-J. and Leung, K.-N. and Standiford, K. and Wilde, S. B.}, year={2002}, month=nov, pages={2717–2720} }