DOI: 10.1116/1.1421557. Thermal conductivity measurements of thin-film resist

Thermal conductivity measurements of thin-film resist

10.1116/1.1421557

Crossref journal-article

American Vacuum Society

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena (20)

Abstract

In electron-beam and photolithography, local heating can change the resist sensitivity and lead to variations in significant critical dimension. Existing models suffer from the lack of experimental data for the thermal properties of the polymer resist films. We present the measurements of both out-of-plane and in-plane thermal conductivity of thin resist films following different exposure conditions. An optical thermoreflectance technique was used to characterize out-of-plane thermal conductivity; the out-of-plane thermal conductivity of exposed SPR™-700 resist increases as a function of exposure dose. We also designed and fabricated a free-standing micro-electrode structure for measuring the in-plane thermal conductivity and results for poly(methylmethacrylate) films were obtained, indicating that, unlike polyimide films, there is no appreciable anisotropic behavior.

Bibliography

Chu, D., Touzelbaev, M., Goodson, K. E., Babin, S., & Pease, R. F. (2001). Thermal conductivity measurements of thin-film resist. Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena, 19(6), 2874â2877.

Authors 5

Dachen Chu (first)
Maxat Touzelbaev (additional)
Kenneth E. Goodson (additional)
Sergey Babin (additional)
R. Fabian Pease (additional)

References 9 Referenced 50

10.1116/1.588678 / J. Vac. Sci. Technol. B (1996)
10.1116/1.590359 / J. Vac. Sci. Technol. B (1998)
10.1103/PhysRevB.35.4067 / Phys. Rev. B (1987)
10.1063/1.1148035 / Rev. Sci. Instrum. (1997)
{'key': '2023080904152609300_r5', 'first-page': '1925', 'volume': '86', 'year': '1998', 'journal-title': 'J. Appl. Phys.'} / J. Appl. Phys. (1998)
10.1063/1.358950 / J. Appl. Phys. (1995)
{'key': '2023080904152609300_r7'}
10.1016/0032-3861(77)90002-7 / Polymer (1977)
{'key': '2023080904152609300_r9'}

Dates

Type	When
Created	23 years ago (July 27, 2002, 5:12 a.m.)
Deposited	2 years ago (Aug. 9, 2023, 12:15 a.m.)
Indexed	1 year, 6 months ago (Feb. 13, 2024, 7:18 p.m.)
Issued	23 years, 9 months ago (Nov. 1, 2001)
Published	23 years, 9 months ago (Nov. 1, 2001)
Published Print	23 years, 9 months ago (Nov. 1, 2001)

Funders 0

None

BibTeX

@article{Chu_2001, title={Thermal conductivity measurements of thin-film resist}, volume={19}, ISSN={1520-8567}, url={http://dx.doi.org/10.1116/1.1421557}, DOI={10.1116/1.1421557}, number={6}, journal={Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena}, publisher={American Vacuum Society}, author={Chu, Dachen and Touzelbaev, Maxat and Goodson, Kenneth E. and Babin, Sergey and Pease, R. Fabian}, year={2001}, month=nov, pages={2874–2877} }

JSON

{
  "indexed": {
    "date-parts": [
      [
        2024,
        2,
        14
      ]
    ],
    "date-time": "2024-02-14T00:18:33Z",
    "timestamp": 1707869913736
  },
  "reference-count": 9,
  "publisher": "American Vacuum Society",
  "issue": "6",
  "content-domain": {
    "domain": [
      "pubs.aip.org"
    ],
    "crossmark-restriction": true
  },
  "published-print": {
    "date-parts": [
      [
        2001,
        11,
        1
      ]
    ]
  },
  "abstract": "<jats:p>In electron-beam and photolithography, local heating can change the resist sensitivity and lead to variations in significant critical dimension. Existing models suffer from the lack of experimental data for the thermal properties of the polymer resist films. We present the measurements of both out-of-plane and in-plane thermal conductivity of thin resist films following different exposure conditions. An optical thermoreflectance technique was used to characterize out-of-plane thermal conductivity; the out-of-plane thermal conductivity of exposed SPR\u2122-700 resist increases as a function of exposure dose. We also designed and fabricated a free-standing micro-electrode structure for measuring the in-plane thermal conductivity and results for poly(methylmethacrylate) films were obtained, indicating that, unlike polyimide films, there is no appreciable anisotropic behavior.</jats:p>",
  "DOI": "10.1116/1.1421557",
  "type": "journal-article",
  "created": {
    "date-parts": [
      [
        2002,
        7,
        27
      ]
    ],
    "date-time": "2002-07-27T09:12:43Z",
    "timestamp": 1027761163000
  },
  "page": "2874-2877",
  "update-policy": "http://dx.doi.org/10.1063/aip-crossmark-policy-page",
  "source": "Crossref",
  "is-referenced-by-count": 50,
  "title": "Thermal conductivity measurements of thin-film resist",
  "prefix": "10.1116",
  "volume": "19",
  "author": [
    {
      "given": "Dachen",
      "family": "Chu",
      "sequence": "first",
      "affiliation": [
        {
          "name": "Solid State and Photonics Laboratory, Center for Integrated Systems, Stanford University, Stanford, California\u200994305-4075"
        }
      ]
    },
    {
      "given": "Maxat",
      "family": "Touzelbaev",
      "sequence": "additional",
      "affiliation": [
        {
          "name": "Mechanical Engineering Department, Stanford University, Stanford, California\u200994305"
        }
      ]
    },
    {
      "given": "Kenneth E.",
      "family": "Goodson",
      "sequence": "additional",
      "affiliation": [
        {
          "name": "Mechanical Engineering Department, Stanford University, Stanford, California\u200994305"
        }
      ]
    },
    {
      "given": "Sergey",
      "family": "Babin",
      "sequence": "additional",
      "affiliation": [
        {
          "name": "Etec Systems"
        }
      ]
    },
    {
      "given": "R. Fabian",
      "family": "Pease",
      "sequence": "additional",
      "affiliation": [
        {
          "name": "Solid State and Photonics Laboratory, Center for Integrated Systems, Stanford University, Stanford, California\u200994305-4075"
        }
      ]
    }
  ],
  "member": "20",
  "reference": [
    {
      "key": "2023080904152609300_r1",
      "doi-asserted-by": "crossref",
      "first-page": "3839",
      "DOI": "10.1116/1.588678",
      "volume": "14",
      "year": "1996",
      "journal-title": "J. Vac. Sci. Technol. B"
    },
    {
      "key": "2023080904152609300_r2",
      "doi-asserted-by": "crossref",
      "first-page": "3241",
      "DOI": "10.1116/1.590359",
      "volume": "16",
      "year": "1998",
      "journal-title": "J. Vac. Sci. Technol. B"
    },
    {
      "key": "2023080904152609300_r3",
      "doi-asserted-by": "crossref",
      "first-page": "4067",
      "DOI": "10.1103/PhysRevB.35.4067",
      "volume": "35",
      "year": "1987",
      "journal-title": "Phys. Rev. B"
    },
    {
      "key": "2023080904152609300_r4",
      "doi-asserted-by": "crossref",
      "first-page": "3828",
      "DOI": "10.1063/1.1148035",
      "volume": "68",
      "year": "1997",
      "journal-title": "Rev. Sci. Instrum."
    },
    {
      "key": "2023080904152609300_r5",
      "first-page": "1925",
      "volume": "86",
      "year": "1998",
      "journal-title": "J. Appl. Phys."
    },
    {
      "key": "2023080904152609300_r6",
      "doi-asserted-by": "crossref",
      "first-page": "1385",
      "DOI": "10.1063/1.358950",
      "volume": "77",
      "year": "1995",
      "journal-title": "J. Appl. Phys."
    },
    {
      "key": "2023080904152609300_r7"
    },
    {
      "key": "2023080904152609300_r8",
      "doi-asserted-by": "crossref",
      "first-page": "984",
      "DOI": "10.1016/0032-3861(77)90002-7",
      "volume": "18",
      "year": "1977",
      "journal-title": "Polymer"
    },
    {
      "key": "2023080904152609300_r9"
    }
  ],
  "container-title": "Journal of Vacuum Science &amp; Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena",
  "original-title": [],
  "language": "en",
  "link": [
    {
      "URL": "https://pubs.aip.org/avs/jvb/article-pdf/19/6/2874/10991701/2874_1_online.pdf",
      "content-type": "application/pdf",
      "content-version": "vor",
      "intended-application": "syndication"
    },
    {
      "URL": "https://pubs.aip.org/avs/jvb/article-pdf/19/6/2874/10991701/2874_1_online.pdf",
      "content-type": "unspecified",
      "content-version": "vor",
      "intended-application": "similarity-checking"
    }
  ],
  "deposited": {
    "date-parts": [
      [
        2023,
        8,
        9
      ]
    ],
    "date-time": "2023-08-09T04:15:35Z",
    "timestamp": 1691554535000
  },
  "score": 1,
  "resource": {
    "primary": {
      "URL": "https://pubs.aip.org/jvb/article/19/6/2874/1073903/Thermal-conductivity-measurements-of-thin-film"
    }
  },
  "subtitle": [],
  "short-title": [],
  "issued": {
    "date-parts": [
      [
        2001,
        11,
        1
      ]
    ]
  },
  "references-count": 9,
  "journal-issue": {
    "issue": "6",
    "published-print": {
      "date-parts": [
        [
          2001,
          11,
          1
        ]
      ]
    }
  },
  "URL": "http://dx.doi.org/10.1116/1.1421557",
  "relation": {},
  "ISSN": [
    "1071-1023",
    "1520-8567"
  ],
  "subject": [],
  "published-other": {
    "date-parts": [
      [
        2001,
        11
      ]
    ]
  },
  "published": {
    "date-parts": [
      [
        2001,
        11,
        1
      ]
    ]
  }
}