DOI: 10.1116/1.1368198. Broad ion beam milling of focused ion beam prepared transmission electron microscopy cross sections for high resolution electron microscopy

Broad ion beam milling of focused ion beam prepared transmission electron microscopy cross sections for high resolution electron microscopy

10.1116/1.1368198

Crossref journal-article

American Vacuum Society

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films (20)

Abstract

A technique is presented which enables both sides of a transmission electron microscopy cross section specimen prepared using a focused ion beam system to be milled using a broad ion beam source. The cross section specimen is prepared using the “lift-out” technique and is placed onto a copper mesh grid with 10 μm sized holes. The upper face of the cross section specimen is first milled in a broad ion beam source, after which a micromanipulator and needle is used to turn it over so that the other side can be milled. The use of a broad ion beam source enables lower incident beam energies and angles of incidence to be used than is currently possible in a commercial focused ion beam system. The technique can be used to decrease the thickness of the damage layer at the sidewalls of a focused ion beam prepared cross section specimen and to reduce its thickness in a controlled way.

Bibliography

Langford, R. M., & Petford-Long, A. K. (2001). Broad ion beam milling of focused ion beam prepared transmission electron microscopy cross sections for high resolution electron microscopy. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 19(3), 982â985.

Authors 2

R. M. Langford (first)
A. K. Petford-Long (additional)

References 20 Referenced 35

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10.1116/1.586536 / J. Vac. Sci. Technol. B (1993)
10.1116/1.590202 / J. Vac. Sci. Technol. B (1998)
10.1147/rd.423.0509 / IBM J. Res. Dev. (1998)
{'key': '2023062817542350000_r5', 'first-page': '465', 'volume': '157', 'year': '1999', 'journal-title': 'Inst. Phys. Conf. Ser.'} / Inst. Phys. Conf. Ser. (1999)
10.1017/S1431927600008618 / Microsc. Microanal. (1997)
10.1016/S0960-8974(98)00005-9 / Prog. Cryst. Growth Charact. (1998)
{'key': '2023062817542350000_r8', 'first-page': '1907', 'volume': '16', 'year': '1998', 'journal-title': 'J. Vac. Sci. Technol. B'} / J. Vac. Sci. Technol. B (1998)
{'key': '2023062817542350000_r9', 'first-page': '962', 'volume': '13', 'year': '1998', 'journal-title': 'J. Vac. Sci. Technol. B'} / J. Vac. Sci. Technol. B (1998)
10.1116/1.581245 / J. Vac. Sci. Technol. A (1998)
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{'key': '2023062817542350000_r12'}
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10.1016/S0304-3991(97)00120-4 / Ultramicroscopy (1998)
{'key': '2023062817542350000_r18'}
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Dates

Type	When
Created	23 years ago (July 27, 2002, 5:18 a.m.)
Deposited	2 years, 1 month ago (June 28, 2023, 2:15 p.m.)
Indexed	1 year ago (Aug. 6, 2024, 7:15 a.m.)
Issued	24 years, 3 months ago (May 1, 2001)
Published	24 years, 3 months ago (May 1, 2001)
Published Print	24 years, 3 months ago (May 1, 2001)

Funders 0

None

BibTeX

@article{Langford_2001, title={Broad ion beam milling of focused ion beam prepared transmission electron microscopy cross sections for high resolution electron microscopy}, volume={19}, ISSN={1520-8559}, url={http://dx.doi.org/10.1116/1.1368198}, DOI={10.1116/1.1368198}, number={3}, journal={Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films}, publisher={American Vacuum Society}, author={Langford, R. M. and Petford-Long, A. K.}, year={2001}, month=may, pages={982–985} }

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