DOI: 10.1116/1.1355757. Modeling particle formation during low-pressure silane oxidation: Detailed chemical kinetics and aerosol dynamics

Modeling particle formation during low-pressure silane oxidation: Detailed chemical kinetics and aerosol dynamics

10.1116/1.1355757

Crossref journal-article

American Vacuum Society

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films (20)

Abstract

A detailed chemical kinetic model is presented for silicon oxide clustering that leads to particle nucleation during low-pressure silane oxidation. Quantum Rice–Ramsperger–Kassel theory was applied to an existing high-pressure silane oxidation mechanism to obtain estimates for the pressure dependence of rate parameters. Four classes of clustering pathways were considered based on current knowledge of reaction kinetics and cluster properties in the Si–H–O system. The species conservation equations and a moment-type aerosol dynamics model were formulated for a batch reactor undergoing homogeneous nucleation and particle growth by surface reactions and coagulation. The chemical kinetics model was coupled to the aerosol dynamics model, and time-dependent zero-dimensional simulations were conducted. The effects of pressure and temperature were examined, and the main contributing processes to particle formation and growth were assessed, for conditions around 0.8 Torr, 773 K, and an initial oxygen-to-silane ratio of 15.

Bibliography

Suh, S.-M., Zachariah, M. R., & Girshick, S. L. (2001). Modeling particle formation during low-pressure silane oxidation: Detailed chemical kinetics and aerosol dynamics. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 19(3), 940â951.

Authors 3

S.-M. Suh (first)
M. R. Zachariah (additional)
S. L. Girshick (additional)

References 35 Referenced 35

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Dates

Type	When
Created	23 years, 1 month ago (July 27, 2002, 5:18 a.m.)
Deposited	1 year, 7 months ago (Jan. 5, 2024, 4:31 p.m.)
Indexed	1 month, 1 week ago (July 25, 2025, 6:08 a.m.)
Issued	24 years, 4 months ago (May 1, 2001)
Published	24 years, 4 months ago (May 1, 2001)
Published Print	24 years, 4 months ago (May 1, 2001)

Funders 0

None

BibTeX

@article{Suh_2001, title={Modeling particle formation during low-pressure silane oxidation: Detailed chemical kinetics and aerosol dynamics}, volume={19}, ISSN={1520-8559}, url={http://dx.doi.org/10.1116/1.1355757}, DOI={10.1116/1.1355757}, number={3}, journal={Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films}, publisher={American Vacuum Society}, author={Suh, S.-M. and Zachariah, M. R. and Girshick, S. L.}, year={2001}, month=may, pages={940–951} }

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