DOI: 10.1116/1.1319689. Three-dimensional nanostructure fabrication by focused-ion-beam chemical vapor deposition

Three-dimensional nanostructure fabrication by focused-ion-beam chemical vapor deposition

10.1116/1.1319689

Crossref journal-article

American Vacuum Society

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena (20)

Abstract

Three-dimensional nanostructure fabrication has been demonstrated by 30 keV Ga+ focused ion beam assisted deposition using a aromatic hydrocarbon precursor. The characterization of deposited film on a silicon substrate was performed by a transmission microscope and Raman spectra. This result indicates that the deposition film is a diamondlike amorphous carbon. Production of three-dimensional nanostructure is discussed. Microcoil, drill, and bellows with 0.1 μm dimension were fabricated as parts of the microsystem. Furthermore, microstructure plastic arts is advocated as a new field using microbeam technology, presenting one example of a microwine glass with 2.75 μm external diameter and 12 μm height.

Bibliography

Matsui, S., Kaito, T., Fujita, J., Komuro, M., Kanda, K., & Haruyama, Y. (2000). Three-dimensional nanostructure fabrication by focused-ion-beam chemical vapor deposition. Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena, 18(6), 3181â3184.

Authors 6

Shinji Matsui (first)
Takashi Kaito (additional)
Jun-ichi Fujita (additional)
Masanori Komuro (additional)
Kazuhiro Kanda (additional)
Yuichi Haruyama (additional)

References 6 Referenced 361

10.1109/5.573752 / Proc. IEEE (1997)
{'key': '2023080905513811500_r2', 'first-page': '91', 'volume': '265', 'year': '1994', 'journal-title': 'NATO ASI Ser., Ser. E'} / NATO ASI Ser., Ser. E (1994)
10.1143/JJAP.33.7099 / Jpn. J. Appl. Phys., Part 1 (1994)
10.1116/1.585115 / J. Vac. Sci. Technol. B (1990)
{'key': '2023080905513811500_r4a'}
10.1063/1.342063 / J. Appl. Phys. (1988)

Dates

Type	When
Created	23 years, 1 month ago (July 27, 2002, 5:18 a.m.)
Deposited	2 years ago (Aug. 9, 2023, 2:16 a.m.)
Indexed	3 weeks, 6 days ago (Aug. 7, 2025, 4:43 p.m.)
Issued	24 years, 10 months ago (Nov. 1, 2000)
Published	24 years, 10 months ago (Nov. 1, 2000)
Published Print	24 years, 10 months ago (Nov. 1, 2000)

Funders 0

None

BibTeX

@article{Matsui_2000, title={Three-dimensional nanostructure fabrication by focused-ion-beam chemical vapor deposition}, volume={18}, ISSN={1520-8567}, url={http://dx.doi.org/10.1116/1.1319689}, DOI={10.1116/1.1319689}, number={6}, journal={Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena}, publisher={American Vacuum Society}, author={Matsui, Shinji and Kaito, Takashi and Fujita, Jun-ichi and Komuro, Masanori and Kanda, Kazuhiro and Haruyama, Yuichi}, year={2000}, month=nov, pages={3181–3184} }

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