Crossref journal-article
American Vacuum Society
Journal of Vacuum Science and Technology (20)
Abstract

Glow discharge optical spectroscopy was used as a technique for monitoring the rate of sputtering and the rate of film deposition. It was determined that within the pressure and voltage range of these experiments the product of the electroluminescent emission intensity of a given sputtered target species in the discharge and the time of sputtering is linearly proportional to both the change in mass of the target and the final thickness of the deposited film. In the case of compound targets, the emission intensity from either constituent can be monitored. The emission signal was shown to be generated primarily in a narrow region directly in front of the target.

Bibliography

Greene, J. E., & Sequeda-Osorio, F. (1973). Glow Discharge Optical Spectroscopy for Monitoring Sputter Deposited Film Thickness. Journal of Vacuum Science and Technology, 10(6), 1144–1149.

Authors 2
  1. J. E. Greene (first)
  2. F. Sequeda-Osorio (additional)
References 0 Referenced 40

None

Dates
Type When
Created 23 years, 1 month ago (July 27, 2002, 5:29 a.m.)
Deposited 2 years, 2 months ago (June 23, 2023, 12:20 p.m.)
Indexed 4 months, 2 weeks ago (April 18, 2025, 11:04 a.m.)
Issued 51 years, 10 months ago (Nov. 1, 1973)
Published 51 years, 10 months ago (Nov. 1, 1973)
Published Print 51 years, 10 months ago (Nov. 1, 1973)
Funders 0

None

@article{Greene_1973, title={Glow Discharge Optical Spectroscopy for Monitoring Sputter Deposited Film Thickness}, volume={10}, ISSN={0022-5355}, url={http://dx.doi.org/10.1116/1.1318510}, DOI={10.1116/1.1318510}, number={6}, journal={Journal of Vacuum Science and Technology}, publisher={American Vacuum Society}, author={Greene, J. E. and Sequeda-Osorio, F.}, year={1973}, month=nov, pages={1144–1149} }