DOI: 10.1116/1.1316651. Structural and Electrical Properties of Sputtered CrNi Films

Structural and Electrical Properties of Sputtered CrNi Films

10.1116/1.1316651

Crossref journal-article

American Vacuum Society

Journal of Vacuum Science and Technology (20)

Abstract

The resistivity, temperature coefficient of resistance (TCR) and the crystal structure of CrNi films were studied in the composition range of 10–90% Cr, balance Ni. The films were triode sputtered on glass substrates at temperatures below 80 °C. In addition the influence of alloying with Si, Mo, and Al has been investigated. A new metastable phase of unknown structure is reported. The experiments show that the resistivity and TCR are insensitive to the Cr content except for samples containing 10% and 90% Cr and insensitive to the crystal structure.

Bibliography

Mooij, J. H., & de Jong, M. (1972). Structural and Electrical Properties of Sputtered CrNi Films. Journal of Vacuum Science and Technology, 9(1), 446â449.

Authors 2

J. H. Mooij (first)
M. de Jong (additional)

References 0 Referenced 32

None

Dates

Type	When
Created	23 years ago (July 27, 2002, 5:32 a.m.)
Deposited	2 years, 2 months ago (June 23, 2023, 11:13 a.m.)
Indexed	2 days, 12 hours ago (Aug. 23, 2025, 12:59 a.m.)
Issued	53 years, 7 months ago (Jan. 1, 1972)
Published	53 years, 7 months ago (Jan. 1, 1972)
Published Print	53 years, 7 months ago (Jan. 1, 1972)

Funders 0

None

BibTeX

@article{Mooij_1972, title={Structural and Electrical Properties of Sputtered CrNi Films}, volume={9}, ISSN={0022-5355}, url={http://dx.doi.org/10.1116/1.1316651}, DOI={10.1116/1.1316651}, number={1}, journal={Journal of Vacuum Science and Technology}, publisher={American Vacuum Society}, author={Mooij, J. H. and de Jong, M.}, year={1972}, month=jan, pages={446–449} }

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