DOI: 10.1116/1.1314384. Pattern generators and microcolumns for ion beam lithography

Pattern generators and microcolumns for ion beam lithography

10.1116/1.1314384

Crossref journal-article

American Vacuum Society

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena (20)

Abstract

A self-aligned microfabrication process has been developed for micron-sized extraction systems, which can be used for pattern generators or microcolumns in ion beam lithography. The extraction of ions from a plasma source through micron-sized apertures is shown not to follow traditional design rules, and the governing equations of interest for meeting design parameters are presented. First order focal properties of the pattern generator and microcolumn are described using Davisson and Calbick’s derivation [C. J. Davisson and C. J. Calbick, Phys. Rev. 38, 558 (1931); 42, 580 (1932)] for an aperture lens. A second order refinement of the focal properties is characterized and explained with computer simulations using MEBS©.

Bibliography

Scott, K. L., King, T.-J., Lieberman, M. A., & Leung, K.-N. (2000). Pattern generators and microcolumns for ion beam lithography. Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena, 18(6), 3172â3176.

Authors 4

K. L. Scott (first)
T.-J. King (additional)
M. A. Lieberman (additional)
K.-N. Leung (additional)

References 16 Referenced 5

10.1116/1.591065 / J. Vac. Sci. Technol. B (1999)
{'key': '2023080905522312400_r2', 'first-page': '3775', 'volume': '14', 'year': '1996', 'journal-title': 'J. Vac. Sci. Technol. B'} / J. Vac. Sci. Technol. B (1996)
{'key': '2023080905522312400_r3'}
{'key': '2023080905522312400_r4'}
{'key': '2023080905522312400_r5'}
{'key': '2023080905522312400_r6'}
{'key': '2023080905522312400_r7', 'first-page': '558', 'volume': '38', 'year': '1931', 'journal-title': 'Phys. Rev.'} / Phys. Rev. (1931)
{'key': '2023080905522312400_r8', 'first-page': '580', 'volume': '42', 'year': '1932', 'journal-title': 'Phys. Rev.'} / Phys. Rev. (1932)
{'key': '2023080905522312400_r9'}
{'key': '2023080905522312400_r10'}
10.1088/0370-1301/65/8/308 / Proc. Phys. Soc. London, Sect. B (1952)
{'key': '2023080905522312400_r12'}
{'key': '2023080905522312400_r13', 'first-page': '380', 'volume': '11', 'year': '1959', 'journal-title': 'Z. Angew. Phys.'} / Z. Angew. Phys. (1959)
{'key': '2023080905522312400_r14', 'first-page': '219', 'volume': '3', 'year': '1951', 'journal-title': 'Z. Angew. Phys.'} / Z. Angew. Phys. (1951)
10.1088/0959-5309/46/6/315 / Proc. Phys. Soc. London (1934)
{'key': '2023080905522312400_r16'}

Dates

Type	When
Created	23 years ago (July 27, 2002, 5:18 a.m.)
Deposited	2 years ago (Aug. 9, 2023, 2:19 a.m.)
Indexed	2 years ago (Aug. 9, 2023, 3:13 a.m.)
Issued	24 years, 9 months ago (Nov. 1, 2000)
Published	24 years, 9 months ago (Nov. 1, 2000)
Published Print	24 years, 9 months ago (Nov. 1, 2000)

Funders 0

None

BibTeX

@article{Scott_2000, title={Pattern generators and microcolumns for ion beam lithography}, volume={18}, ISSN={1520-8567}, url={http://dx.doi.org/10.1116/1.1314384}, DOI={10.1116/1.1314384}, number={6}, journal={Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena}, publisher={American Vacuum Society}, author={Scott, K. L. and King, T.-J. and Lieberman, M. A. and Leung, K.-N.}, year={2000}, month=nov, pages={3172–3176} }

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