DOI: 10.1116/1.1288192. Effects of oxygen gettering and target mode change in the formation process of reactively sputtered Pt oxide thin films

Effects of oxygen gettering and target mode change in the formation process of reactively sputtered Pt oxide thin films

10.1116/1.1288192

Crossref journal-article

American Vacuum Society

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films (20)

Abstract

Pt, and Pt oxide thin films were prepared by reactive sputtering of Pt in Ar and O2 gas mixtures, and the influence of O2 flow ratio on their formation process was studied. O2 gettering by Pt atoms was confirmed from plasma emission spectra and pressure change in a sputtering chamber before and after striking the discharge. At O2 flow ratios below 20%, almost all of the introduced O2 molecules were gettered and Pt films were deposited. At O2 flow ratios above 20%, the number of supplied O2 molecules overcame the gettering effect and the O2 partial pressure began to increase, and Pt oxide films were deposited. The deposition rate of Pt oxide films decreased at O2 flow ratios above 30%, because the target surface state changed from a metallic target mode to an oxide target mode.

Bibliography

Abe, Y., Kawamura, M., & Sasaki, K. (2000). Effects of oxygen gettering and target mode change in the formation process of reactively sputtered Pt oxide thin films. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 18(5), 2608â2612.

Authors 3

Y. Abe (first)
M. Kawamura (additional)
K. Sasaki (additional)

References 26 Referenced 13

{'key': '2023072400034460700_r1', 'first-page': '1', 'volume': '14', 'year': '1989', 'journal-title': 'Phys. Thin Films'} / Phys. Thin Films (1989)
10.1016/0040-6090(84)90147-0 / Thin Solid Films (1984)
10.1016/0040-6090(76)90006-7 / Thin Solid Films (1976)
10.1063/1.349791 / J. Appl. Phys. (1991)
10.1116/1.578270 / J. Vac. Sci. Technol. A (1992)
10.1016/S0040-6090(89)80018-5 / Thin Solid Films (1989)
10.1016/0040-6090(89)90137-5 / Thin Solid Films (1989)
10.1116/1.580382 / J. Vac. Sci. Technol. A (1996)
10.1143/JJAP.37.3457 / Jpn. J. Appl. Phys., Part 1 (1998)
10.1116/1.573858 / J. Vac. Sci. Technol. A (1986)
10.1063/1.347255 / J. Appl. Phys. (1991)
10.1063/1.368883 / J. Appl. Phys. (1998)
10.1143/JJAP.38.2092 / Jpn. J. Appl. Phys., Part 1 (1999)
10.1063/1.371718 / J. Appl. Phys. (1999)
10.1103/PhysRevB.1.1494 / Phys. Rev. B (1970)
{'key': '2023072400034460700_r16'}
10.1063/1.98012 / Appl. Phys. Lett. (1987)
10.1149/1.2095391 / J. Electrochem. Soc. (1988)
10.1149/1.2220877 / J. Electrochem. Soc. (1993)
10.1063/1.111396 / Appl. Phys. Lett. (1994)
10.1143/JJAP.33.5207 / Jpn. J. Appl. Phys., Part 1 (1994)
10.1143/JJAP.38.L870 / Jpn. J. Appl. Phys., Part 2 (1999)
10.1116/1.591385 / J. Vac. Sci. Technol. B (2000)
10.1116/1.581050 / J. Vac. Sci. Technol. A (1998)
{'key': '2023072400034460700_r25'}
{'key': '2023072400034460700_r26'}

Dates

Type	When
Created	23 years ago (July 27, 2002, 5:07 a.m.)
Deposited	2 years, 1 month ago (July 23, 2023, 8:03 p.m.)
Indexed	2 months, 3 weeks ago (June 2, 2025, 3:05 p.m.)
Issued	24 years, 11 months ago (Sept. 1, 2000)
Published	24 years, 11 months ago (Sept. 1, 2000)
Published Print	24 years, 11 months ago (Sept. 1, 2000)

Funders 0

None

BibTeX

@article{Abe_2000, title={Effects of oxygen gettering and target mode change in the formation process of reactively sputtered Pt oxide thin films}, volume={18}, ISSN={1520-8559}, url={http://dx.doi.org/10.1116/1.1288192}, DOI={10.1116/1.1288192}, number={5}, journal={Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films}, publisher={American Vacuum Society}, author={Abe, Y. and Kawamura, M. and Sasaki, K.}, year={2000}, month=sep, pages={2608–2612} }

JSON

{
  "indexed": {
    "date-parts": [
      [
        2025,
        6,
        2
      ]
    ],
    "date-time": "2025-06-02T19:05:15Z",
    "timestamp": 1748891115423
  },
  "reference-count": 26,
  "publisher": "American Vacuum Society",
  "issue": "5",
  "content-domain": {
    "domain": [
      "pubs.aip.org"
    ],
    "crossmark-restriction": true
  },
  "published-print": {
    "date-parts": [
      [
        2000,
        9,
        1
      ]
    ]
  },
  "abstract": "<jats:p>Pt, and Pt oxide thin films were prepared by reactive sputtering of Pt in Ar and O2 gas mixtures, and the influence of O2 flow ratio on their formation process was studied. O2 gettering by Pt atoms was confirmed from plasma emission spectra and pressure change in a sputtering chamber before and after striking the discharge. At O2 flow ratios below 20%, almost all of the introduced O2 molecules were gettered and Pt films were deposited. At O2 flow ratios above 20%, the number of supplied O2 molecules overcame the gettering effect and the O2 partial pressure began to increase, and Pt oxide films were deposited. The deposition rate of Pt oxide films decreased at O2 flow ratios above 30%, because the target surface state changed from a metallic target mode to an oxide target mode.</jats:p>",
  "DOI": "10.1116/1.1288192",
  "type": "journal-article",
  "created": {
    "date-parts": [
      [
        2002,
        7,
        27
      ]
    ],
    "date-time": "2002-07-27T09:07:43Z",
    "timestamp": 1027760863000
  },
  "page": "2608-2612",
  "update-policy": "http://dx.doi.org/10.1063/aip-crossmark-policy-page",
  "source": "Crossref",
  "is-referenced-by-count": 13,
  "title": "Effects of oxygen gettering and target mode change in the formation process of reactively sputtered Pt oxide thin films",
  "prefix": "10.1116",
  "volume": "18",
  "author": [
    {
      "given": "Y.",
      "family": "Abe",
      "sequence": "first",
      "affiliation": [
        {
          "name": "Department of Materials Science, Faculty of Engineering, Kitami Institute of Technology, 165 Koen-cho, Kitami\u2009090-8507, Japan"
        }
      ]
    },
    {
      "given": "M.",
      "family": "Kawamura",
      "sequence": "additional",
      "affiliation": [
        {
          "name": "Department of Materials Science, Faculty of Engineering, Kitami Institute of Technology, 165 Koen-cho, Kitami\u2009090-8507, Japan"
        }
      ]
    },
    {
      "given": "K.",
      "family": "Sasaki",
      "sequence": "additional",
      "affiliation": [
        {
          "name": "Department of Materials Science, Faculty of Engineering, Kitami Institute of Technology, 165 Koen-cho, Kitami\u2009090-8507, Japan"
        }
      ]
    }
  ],
  "member": "20",
  "reference": [
    {
      "key": "2023072400034460700_r1",
      "first-page": "1",
      "volume": "14",
      "year": "1989",
      "journal-title": "Phys. Thin Films"
    },
    {
      "key": "2023072400034460700_r2",
      "doi-asserted-by": "crossref",
      "first-page": "259",
      "DOI": "10.1016/0040-6090(84)90147-0",
      "volume": "111",
      "year": "1984",
      "journal-title": "Thin Solid Films"
    },
    {
      "key": "2023072400034460700_r3",
      "doi-asserted-by": "crossref",
      "first-page": "271",
      "DOI": "10.1016/0040-6090(76)90006-7",
      "volume": "38",
      "year": "1976",
      "journal-title": "Thin Solid Films"
    },
    {
      "key": "2023072400034460700_r4",
      "doi-asserted-by": "crossref",
      "first-page": "7089",
      "DOI": "10.1063/1.349791",
      "volume": "70",
      "year": "1991",
      "journal-title": "J. Appl. Phys."
    },
    {
      "key": "2023072400034460700_r5",
      "doi-asserted-by": "crossref",
      "first-page": "1483",
      "DOI": "10.1116/1.578270",
      "volume": "10",
      "year": "1992",
      "journal-title": "J. Vac. Sci. Technol. A"
    },
    {
      "key": "2023072400034460700_r6",
      "doi-asserted-by": "crossref",
      "first-page": "17",
      "DOI": "10.1016/S0040-6090(89)80018-5",
      "volume": "169",
      "year": "1989",
      "journal-title": "Thin Solid Films"
    },
    {
      "key": "2023072400034460700_r7",
      "doi-asserted-by": "crossref",
      "first-page": "217",
      "DOI": "10.1016/0040-6090(89)90137-5",
      "volume": "173",
      "year": "1989",
      "journal-title": "Thin Solid Films"
    },
    {
      "key": "2023072400034460700_r8",
      "doi-asserted-by": "crossref",
      "first-page": "747",
      "DOI": "10.1116/1.580382",
      "volume": "14",
      "year": "1996",
      "journal-title": "J. Vac. Sci. Technol. A"
    },
    {
      "key": "2023072400034460700_r9",
      "doi-asserted-by": "crossref",
      "first-page": "3457",
      "DOI": "10.1143/JJAP.37.3457",
      "volume": "37",
      "year": "1998",
      "journal-title": "Jpn. J. Appl. Phys., Part 1"
    },
    {
      "key": "2023072400034460700_r10",
      "doi-asserted-by": "crossref",
      "first-page": "606",
      "DOI": "10.1116/1.573858",
      "volume": "4",
      "year": "1986",
      "journal-title": "J. Vac. Sci. Technol. A"
    },
    {
      "key": "2023072400034460700_r11",
      "doi-asserted-by": "crossref",
      "first-page": "1596",
      "DOI": "10.1063/1.347255",
      "volume": "69",
      "year": "1991",
      "journal-title": "J. Appl. Phys."
    },
    {
      "key": "2023072400034460700_r12",
      "doi-asserted-by": "crossref",
      "first-page": "6382",
      "DOI": "10.1063/1.368883",
      "volume": "84",
      "year": "1998",
      "journal-title": "J. Appl. Phys."
    },
    {
      "key": "2023072400034460700_r13",
      "doi-asserted-by": "crossref",
      "first-page": "2092",
      "DOI": "10.1143/JJAP.38.2092",
      "volume": "38",
      "year": "1999",
      "journal-title": "Jpn. J. Appl. Phys., Part 1"
    },
    {
      "key": "2023072400034460700_r14",
      "doi-asserted-by": "crossref",
      "first-page": "6084",
      "DOI": "10.1063/1.371718",
      "volume": "86",
      "year": "1999",
      "journal-title": "J. Appl. Phys."
    },
    {
      "key": "2023072400034460700_r15",
      "doi-asserted-by": "crossref",
      "first-page": "1494",
      "DOI": "10.1103/PhysRevB.1.1494",
      "volume": "1",
      "year": "1970",
      "journal-title": "Phys. Rev. B"
    },
    {
      "key": "2023072400034460700_r16"
    },
    {
      "key": "2023072400034460700_r17",
      "doi-asserted-by": "crossref",
      "first-page": "854",
      "DOI": "10.1063/1.98012",
      "volume": "50",
      "year": "1987",
      "journal-title": "Appl. Phys. Lett."
    },
    {
      "key": "2023072400034460700_r18",
      "doi-asserted-by": "crossref",
      "first-page": "2610",
      "DOI": "10.1149/1.2095391",
      "volume": "135",
      "year": "1988",
      "journal-title": "J. Electrochem. Soc."
    },
    {
      "key": "2023072400034460700_r19",
      "doi-asserted-by": "crossref",
      "first-page": "2640",
      "DOI": "10.1149/1.2220877",
      "volume": "140",
      "year": "1993",
      "journal-title": "J. Electrochem. Soc."
    },
    {
      "key": "2023072400034460700_r20",
      "doi-asserted-by": "crossref",
      "first-page": "2967",
      "DOI": "10.1063/1.111396",
      "volume": "64",
      "year": "1994",
      "journal-title": "Appl. Phys. Lett."
    },
    {
      "key": "2023072400034460700_r21",
      "doi-asserted-by": "crossref",
      "first-page": "5207",
      "DOI": "10.1143/JJAP.33.5207",
      "volume": "33",
      "year": "1994",
      "journal-title": "Jpn. J. Appl. Phys., Part 1"
    },
    {
      "key": "2023072400034460700_r22",
      "doi-asserted-by": "crossref",
      "first-page": "L870",
      "DOI": "10.1143/JJAP.38.L870",
      "volume": "38",
      "year": "1999",
      "journal-title": "Jpn. J. Appl. Phys., Part 2"
    },
    {
      "key": "2023072400034460700_r23",
      "doi-asserted-by": "crossref",
      "first-page": "1348",
      "DOI": "10.1116/1.591385",
      "volume": "18",
      "year": "2000",
      "journal-title": "J. Vac. Sci. Technol. B"
    },
    {
      "key": "2023072400034460700_r24",
      "doi-asserted-by": "crossref",
      "first-page": "502",
      "DOI": "10.1116/1.581050",
      "volume": "16",
      "year": "1998",
      "journal-title": "J. Vac. Sci. Technol. A"
    },
    {
      "key": "2023072400034460700_r25"
    },
    {
      "key": "2023072400034460700_r26"
    }
  ],
  "container-title": "Journal of Vacuum Science &amp; Technology A: Vacuum, Surfaces, and Films",
  "original-title": [],
  "language": "en",
  "link": [
    {
      "URL": "https://pubs.aip.org/avs/jva/article-pdf/18/5/2608/11210415/2608_1_online.pdf",
      "content-type": "application/pdf",
      "content-version": "vor",
      "intended-application": "syndication"
    },
    {
      "URL": "https://pubs.aip.org/avs/jva/article-pdf/18/5/2608/11210415/2608_1_online.pdf",
      "content-type": "unspecified",
      "content-version": "vor",
      "intended-application": "similarity-checking"
    }
  ],
  "deposited": {
    "date-parts": [
      [
        2023,
        7,
        24
      ]
    ],
    "date-time": "2023-07-24T00:03:55Z",
    "timestamp": 1690157035000
  },
  "score": 1,
  "resource": {
    "primary": {
      "URL": "https://pubs.aip.org/jva/article/18/5/2608/754794/Effects-of-oxygen-gettering-and-target-mode-change"
    }
  },
  "subtitle": [],
  "short-title": [],
  "issued": {
    "date-parts": [
      [
        2000,
        9,
        1
      ]
    ]
  },
  "references-count": 26,
  "journal-issue": {
    "issue": "5",
    "published-print": {
      "date-parts": [
        [
          2000,
          9,
          1
        ]
      ]
    }
  },
  "URL": "http://dx.doi.org/10.1116/1.1288192",
  "relation": {},
  "ISSN": [
    "0734-2101",
    "1520-8559"
  ],
  "subject": [],
  "published-other": {
    "date-parts": [
      [
        2000,
        9
      ]
    ]
  },
  "published": {
    "date-parts": [
      [
        2000,
        9,
        1
      ]
    ]
  }
}