DOI: 10.1111/j.1365-2818.1973.tb03782.x. The response of photographic materials to electrons with particular reference to electron micrography

The response of photographic materials to electrons with particular reference to electron micrography

10.1111/j.1365-2818.1973.tb03782.x

Crossref journal-article

Wiley

Journal of Microscopy (311)

Abstract

SUMMARYThe response of photographic emulsion layers to electron beam exposures is reviewed in simple terms, particularly for those energies used in conventional electron micrography. Emphasis is placed on the way many features of response are determined by the fact that a single electron serves to render several grains developable. In particular it is shown that the contrast is independent of emulsion/developer combination, the granularity is uniquely related to the speed, and the signal/noise ratio increases with exposure irrespective of the conditions leading to exposure increase. Demonstrations of these aspects are presented. Factors governing image spread are also outlined. The dependence of the minimum magnification for observation of details of a given size on this property is discussed.

Bibliography

Farnell, G. C., & Flint, B. (1973). The response of photographic materials to electrons with particular reference to electron micrography. Journal of Microscopy, 97(3), 271â291. Portico.

Authors 2

G. C. Farnell (first)
B. Flint (additional)

References 15 Referenced 21

10.1007/BF02726436
10.1088/0022-3735/1/7/303
10.1088/0022-3735/1/7/304
10.1080/00223638.1968.11737466 / J. photogr. Sci. / The efficiency of the photographic process by Davies E. R. (1968)
10.1080/03700240.1953.11736606 / J. photogr. Sci. / The photographic effect of medium energy electrons by Digby N. (1953)
10.1111/j.1365-2818.1969.tb00647.x
10.1111/j.1365-2818.1970.tb02246.x
10.1080/00223638.1968.11737473 / J. photogr. Sci. / The relationship between surface and internal sensitivity of individual grains by Farnell G.C. (1968)
{'key': 'e_1_2_1_10_1', 'first-page': '337', 'article-title': 'Properties of photographic emulsions with respect to electron radiation', 'volume': '10', 'author': 'Frieser H.', 'year': '1958', 'journal-title': 'Z. angew. Phys.'} / Z. angew. Phys. / Properties of photographic emulsions with respect to electron radiation by Frieser H. (1958)
{'key': 'e_1_2_1_11_1', 'volume-title': 'The Theory of the Photographic Process', 'author': 'Hamilton J.F.', 'year': '1966'} / The Theory of the Photographic Process by Hamilton J.F. (1966)
10.1364/JOSA.57.000232
{'key': 'e_1_2_1_13_1', 'volume-title': 'The Theory of the Photographic Process', 'author': 'Perrin F.H.', 'year': '1966'} / The Theory of the Photographic Process by Perrin F.H. (1966)
10.1103/RevModPhys.13.240
10.1364/JOSA.54.000498
{'key': 'e_1_2_1_16_1', 'volume-title': 'Advances in Optical and Electron Microscopy', 'author': 'Valentine R.C.', 'year': '1966'} / Advances in Optical and Electron Microscopy by Valentine R.C. (1966)

Dates

Type	When
Created	14 years ago (Aug. 2, 2011, 10:48 a.m.)
Deposited	1 year, 10 months ago (Oct. 15, 2023, 4:23 p.m.)
Indexed	1 year, 9 months ago (Nov. 10, 2023, 7:39 p.m.)
Issued	52 years, 4 months ago (April 1, 1973)
Published	52 years, 4 months ago (April 1, 1973)
Published Online	14 years ago (Aug. 2, 2011)
Published Print	52 years, 4 months ago (April 1, 1973)

Funders 0

None

BibTeX

@article{Farnell_1973, title={The response of photographic materials to electrons with particular reference to electron micrography}, volume={97}, ISSN={1365-2818}, url={http://dx.doi.org/10.1111/j.1365-2818.1973.tb03782.x}, DOI={10.1111/j.1365-2818.1973.tb03782.x}, number={3}, journal={Journal of Microscopy}, publisher={Wiley}, author={Farnell, G. C. and Flint, B.}, year={1973}, month=apr, pages={271–291} }

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