DOI: 10.1111/j.1151-2916.1996.tb08742.x. Silicon Nitride Oxidation Based on Oxynitride Interlayers with Graded Stoichiometry

Silicon Nitride Oxidation Based on Oxynitride Interlayers with Graded Stoichiometry

10.1111/j.1151-2916.1996.tb08742.x

Crossref journal-article

Wiley

Journal of the American Ceramic Society (311)

Abstract

The oxidation kinetics of Si3N4 were modeled by describing the simultaneous diffusion and reaction of interstitial oxygen that is believed to occur inside of the silicon oxynitride interlayer. The oxynitride was assumed to have a variable composition, and oxidation was described as a reaction where interstitial oxygen is incorporated into the network structure of the oxynitride and nitrogen is removed. It was assumed that both the diffusion coefficient and the solubility of interstitial oxygen decrease as the nitrogen content of the network structure increases. The results accurately describe both the formation of an oxynitride layer during oxidation, and the relatively slow oxidation kinetics of Si3N4 (compared to Si and SiC).

Bibliography

Sheldon, B. W. (1996). Silicon Nitride Oxidation Based on Oxynitride Interlayers with Graded Stoichiometry. Journal of the American Ceramic Society, 79(11), 2993â2996. Portico.

Authors 1

Brian W. Sheldon (first)

References 14 Referenced 18

10.1149/1.2096955
10.1149/1.2085384
10.1111/j.1151-2916.1992.tb04377.x
10.1111/j.1151-2916.1993.tb03684.x
10.1149/1.2096427
10.1149/1.2085355
10.1149/1.2086543
10.1149/1.2056154
10.1038/191701a0
{'key': 'e_1_2_1_11_2', 'first-page': '8', 'volume-title': 'Transactions of the Eighth Annual Vacuum Symposium', 'author': 'Norton F. J.', 'year': '1962'} / Transactions of the Eighth Annual Vacuum Symposium by Norton F. J. (1962)
10.1111/j.1151-2916.1963.tb13763.x
{'key': 'e_1_2_1_13_2', 'first-page': '179', 'article-title': 'Oxygen Diffusion in Vitreous Silica–Utilization of Natural Isotopic Abundances', 'volume': '15', 'author': 'Muehlenbachs K.', 'year': '1977', 'journal-title': 'Can. Mineral'} / Can. Mineral / Oxygen Diffusion in Vitreous Silica–Utilization of Natural Isotopic Abundances by Muehlenbachs K. (1977)
{'key': 'e_1_2_1_14_2', 'volume-title': 'Diffusion in Solids', 'author': 'Shewmon P.', 'year': '1989'} / Diffusion in Solids by Shewmon P. (1989)
{'key': 'e_1_2_1_15_2', 'volume-title': 'Numerical Recipes', 'author': 'Press W. H.', 'year': '1986'} / Numerical Recipes by Press W. H. (1986)

Dates

Type	When
Created	19 years, 11 months ago (Sept. 23, 2005, 10:11 a.m.)
Deposited	1 year, 10 months ago (Oct. 7, 2023, 6:32 a.m.)
Indexed	1 year, 8 months ago (Dec. 19, 2023, 1:25 p.m.)
Issued	28 years, 10 months ago (Nov. 1, 1996)
Published	28 years, 10 months ago (Nov. 1, 1996)
Published Online	19 years, 11 months ago (Sept. 23, 2005)
Published Print	28 years, 10 months ago (Nov. 1, 1996)

Funders 0

None

BibTeX

@article{Sheldon_1996, title={Silicon Nitride Oxidation Based on Oxynitride Interlayers with Graded Stoichiometry}, volume={79}, ISSN={1551-2916}, url={http://dx.doi.org/10.1111/j.1151-2916.1996.tb08742.x}, DOI={10.1111/j.1151-2916.1996.tb08742.x}, number={11}, journal={Journal of the American Ceramic Society}, publisher={Wiley}, author={Sheldon, Brian W.}, year={1996}, month=nov, pages={2993–2996} }

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