DOI: 10.1109/tmag.2002.988918. E-beam writing: a next-generation lithography approach for thin-film head critical features

E-beam writing: a next-generation lithography approach for thin-film head critical features

10.1109/tmag.2002.988918

Crossref journal-article

Institute of Electrical and Electronics Engineers (IEEE)

IEEE Transactions on Magnetics (263)

Bibliography

Fontana, R. E., Katine, J., Rooks, M., Viswanathan, R., Lille, J., MacDonald, S., Kratschmer, E., Tsang, C., Nguyen, S., Robertson, N., & Kasiraj, P. (2002). E-beam writing: a next-generation lithography approach for thin-film head critical features. IEEE Transactions on Magnetics, 38(1), 95â100.

Authors 11

R.E. Fontana (first)
J. Katine (additional)
M. Rooks (additional)
R. Viswanathan (additional)
J. Lille (additional)
S. MacDonald (additional)
E. Kratschmer (additional)
C. Tsang (additional)
S. Nguyen (additional)
N. Robertson (additional)
P. Kasiraj (additional)

References 9 Referenced 42

10.1117/3.2265070.ch2 / Handbook of Microlithography Micromachining and Microfabrication Vol 1 Microlithography / electron beam lithography by mccord (1997)
10.1117/12.390056
{'key': 'ref6', 'article-title': 'introduction to electron beam lithography', 'author': 'mccord', 'year': '2000', 'journal-title': 'Short Course SC 100 SPIE Int Symp Microlithography'} / Short Course SC 100 SPIE Int Symp Microlithography / introduction to electron beam lithography by mccord (2000)
10.1116/1.585998
10.1016/S0038-1101(99)00114-8
10.1117/12.390055
10.1117/12.390073
10.1109/20.750649
10.1109/20.538650

Dates

Type	When
Created	21 years ago (July 27, 2004, 3:58 p.m.)
Deposited	3 years, 7 months ago (Jan. 12, 2022, 11:01 a.m.)
Indexed	3 weeks, 4 days ago (July 30, 2025, 11:25 a.m.)
Issued	23 years, 7 months ago (Jan. 1, 2002)
Published	23 years, 7 months ago (Jan. 1, 2002)
Published Print	23 years, 7 months ago (Jan. 1, 2002)

Funders 0

None

BibTeX

@article{Fontana_2002, title={E-beam writing: a next-generation lithography approach for thin-film head critical features}, volume={38}, ISSN={0018-9464}, url={http://dx.doi.org/10.1109/tmag.2002.988918}, DOI={10.1109/tmag.2002.988918}, number={1}, journal={IEEE Transactions on Magnetics}, publisher={Institute of Electrical and Electronics Engineers (IEEE)}, author={Fontana, R.E. and Katine, J. and Rooks, M. and Viswanathan, R. and Lille, J. and MacDonald, S. and Kratschmer, E. and Tsang, C. and Nguyen, S. and Robertson, N. and Kasiraj, P.}, year={2002}, month=jan, pages={95–100} }

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