DOI: 10.1109/t-ed.1975.18151. Projection electron lithography using aperture lenses

Projection electron lithography using aperture lenses

10.1109/t-ed.1975.18151

Crossref journal-article

Institute of Electrical and Electronics Engineers (IEEE)

IEEE Transactions on Electron Devices (263)

Bibliography

Heynick, L. N., Westerberg, E. R., Hartelius, C. C., & Lee, R. E. (1975). Projection electron lithography using aperture lenses. IEEE Transactions on Electron Devices, 22(7), 399â409.

Authors 4

L.N. Heynick (first)
E.R. Westerberg (additional)
C.C. Hartelius (additional)
R.E. Lee (additional)

References 0 Referenced 9

None

Dates

Type	When
Created	17 years, 7 months ago (Jan. 11, 2008, 1:58 p.m.)
Deposited	1 month, 1 week ago (July 9, 2025, 7:15 p.m.)
Indexed	1 month, 1 week ago (July 10, 2025, 8:01 p.m.)
Issued	50 years, 1 month ago (July 1, 1975)
Published	50 years, 1 month ago (July 1, 1975)
Published Print	50 years, 1 month ago (July 1, 1975)

Funders 0

None

BibTeX

@article{Heynick_1975, title={Projection electron lithography using aperture lenses}, volume={22}, ISSN={1557-9646}, url={http://dx.doi.org/10.1109/t-ed.1975.18151}, DOI={10.1109/t-ed.1975.18151}, number={7}, journal={IEEE Transactions on Electron Devices}, publisher={Institute of Electrical and Electronics Engineers (IEEE)}, author={Heynick, L.N. and Westerberg, E.R. and Hartelius, C.C. and Lee, R.E.}, year={1975}, month=jul, pages={399–409} }

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