DOI: 10.1109/icmel.2004.1314862. Focused ion beam lithography-overview and new approaches

Focused ion beam lithography-overview and new approaches

10.1109/icmel.2004.1314862

Crossref proceedings-article

IEEE

2004 24th International Conference on Microelectronics (IEEE Cat. No.04TH8716) (263)

Authors 5

K. Arshak (first)
M. Mihov (additional)
A. Arshak (additional)
D. McDonagh (additional)
D. Sutton (additional)

References 11 Referenced 7

Dates

Type	When
Created	21 years ago (Aug. 13, 2004, 1:09 a.m.)
Deposited	8 years, 5 months ago (March 13, 2017, 8:54 a.m.)
Indexed	3 months, 3 weeks ago (April 30, 2025, 2:20 p.m.)

Funders 0

None

BibTeX

@inproceedings{Arshak, series={ICMEL-04}, title={Focused ion beam lithography-overview and new approaches}, volume={2}, url={http://dx.doi.org/10.1109/icmel.2004.1314862}, DOI={10.1109/icmel.2004.1314862}, booktitle={2004 24th International Conference on Microelectronics (IEEE Cat. No.04TH8716)}, publisher={IEEE}, author={Arshak, K. and Mihov, M. and Arshak, A. and McDonagh, D. and Sutton, D.}, pages={459–462}, collection={ICMEL-04} }

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