DOI: 10.1109/16.22472. Study of electrochemical etch-stop for high-precision thickness control of silicon membranes

Study of electrochemical etch-stop for high-precision thickness control of silicon membranes

10.1109/16.22472

Crossref journal-article

Institute of Electrical and Electronics Engineers (IEEE)

IEEE Transactions on Electron Devices (263)

Bibliography

Kloeck, B., Collins, S. D., de Rooij, N. F., & Smith, R. L. (1989). Study of electrochemical etch-stop for high-precision thickness control of silicon membranes. IEEE Transactions on Electron Devices, 36(4), 663â669.

Authors 4

B. Kloeck (first)
S.D. Collins (additional)
N.F. de Rooij (additional)
R.L. Smith (additional)

References 17 Referenced 180

{'key': 'ref10', 'author': 'bard', 'year': '1980', 'journal-title': 'Electrochemical Methods'} / Electrochemical Methods by bard (1980)
{'key': 'ref11', 'author': 'lee', 'year': '1982', 'journal-title': 'Modeling and Simulation of Solid State Pressure Sensors'} / Modeling and Simulation of Solid State Pressure Sensors by lee (1982)
10.1063/1.451129
{'key': 'ref13', 'first-page': '74', 'author': 'sze', 'year': '1981', 'journal-title': 'Physics of Semiconductor Devices'} / Physics of Semiconductor Devices by sze (1981)
{'key': 'ref14', 'first-page': '67', 'volume': '5', 'author': 'harrison', 'year': '1971', 'journal-title': 'Electroanalytical Chemistry'} / Electroanalytical Chemistry by harrison (1971)
{'key': 'ref15', 'article-title': 'Mechanism of anodic passivation on ?111? silicon in KOH', 'author': 'smith', 'year': '0', 'journal-title': 'J Electrochem Soc'} / J Electrochem Soc / Mechanism of anodic passivation on ?111? silicon in KOH by smith (0)
{'key': 'ref16', 'first-page': '74', 'article-title': 'Optimized design and fabrication methods for miniature piezoresistive pressure sensors', 'author': 'kloeck', 'year': '1986', 'journal-title': 'Capteurs 86 Conf Proc'} / Capteurs 86 Conf Proc / Optimized design and fabrication methods for miniature piezoresistive pressure sensors by kloeck (1986)
{'key': 'ref17', 'author': 'stauffer', 'year': '1985', 'journal-title': 'Internal Rep'} / Internal Rep by stauffer (1985)
10.1149/1.2100814
10.1109/EDL.1981.25334
10.1149/1.2124367
10.1016/0250-6874(88)85029-7
10.1149/1.2113750
10.1149/1.2119964
10.1149/1.2109003
10.1002/j.1538-7305.1970.tb01783.x / Bell Syst Tech J / Electrochemically controlled thinning of silicon by waggener (1970)
10.1016/0022-0728(87)85168-9

Dates

Type	When
Created	22 years, 11 months ago (Aug. 24, 2002, 4:40 p.m.)
Deposited	3 years, 8 months ago (Nov. 29, 2021, 2:09 p.m.)
Indexed	2 months ago (June 19, 2025, 5:24 a.m.)
Issued	36 years, 4 months ago (April 1, 1989)
Published	36 years, 4 months ago (April 1, 1989)
Published Print	36 years, 4 months ago (April 1, 1989)

Funders 0

None

BibTeX

@article{Kloeck_1989, title={Study of electrochemical etch-stop for high-precision thickness control of silicon membranes}, volume={36}, ISSN={1557-9646}, url={http://dx.doi.org/10.1109/16.22472}, DOI={10.1109/16.22472}, number={4}, journal={IEEE Transactions on Electron Devices}, publisher={Institute of Electrical and Electronics Engineers (IEEE)}, author={Kloeck, B. and Collins, S.D. and de Rooij, N.F. and Smith, R.L.}, year={1989}, month=apr, pages={663–669} }

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