DOI: 10.1103/physrevresearch.2.022025. Berry curvature engineering by gating two-dimensional antiferromagnets

Berry curvature engineering by gating two-dimensional antiferromagnets

10.1103/physrevresearch.2.022025

Crossref journal-article

American Physical Society (APS)

Physical Review Research (16)

Bibliography

Du, S., Tang, P., Li, J., Lin, Z., Xu, Y., Duan, W., & Rubio, A. (2020). Berry curvature engineering by gating two-dimensional antiferromagnets. Physical Review Research, 2(2).

Authors 7

Shiqiao Du (first)
Peizhe Tang (additional)
Jiaheng Li (additional)
Zuzhang Lin (additional)
Yong Xu (additional)
Wenhui Duan (additional)
Angel Rubio (additional)

References 46 Referenced 34

Dates

Type	When
Created	5 years, 3 months ago (May 4, 2020, 1:55 p.m.)
Deposited	5 years, 3 months ago (May 4, 2020, 1:56 p.m.)
Indexed	2 weeks, 1 day ago (Aug. 6, 2025, 9:13 a.m.)
Issued	5 years, 3 months ago (May 4, 2020)
Published	5 years, 3 months ago (May 4, 2020)
Published Online	5 years, 3 months ago (May 4, 2020)

Funders 3

National Natural Science Foundation of China 10.13039/501100001809
Region: Asia
gov (National government)
Labels11
1. Chinese National Science Foundation
2. Natural Science Foundation of China
3. National Science Foundation of China
4. NNSF of China
5. NSF of China
6. 国家自然科学基金委员会
7. National Nature Science Foundation of China
8. Guójiā Zìrán Kēxué Jījīn Wěiyuánhuì
9. NSFC
10. NNSF
11. NNSFC
Awards3
1. 11674188
2. 11874035
3. 51788104
Ministry of Science and Technology of the People's Republic of China 10.13039/501100002855
Region: Asia
gov (National government)
Labels6
1. Chinese Ministry of Science and Technology
2. Ministry of Science & Technology, People Republic of China
3. 中华人民共和国科学技术部
4. Ministry of Science and Technology (China)
5. State Science and Technology Commission
6. MOST
Awards3
1. 2018YFA0307100
2. 2016YFA0301001
3. 2018YFA0305603
Beijing Innovation Center for Future Chip 10.13039/501100012282
Region: Asia
pri (Research institutes and centers)
Labels4
1. Beijing Innovation Center for Future Chip, Tsinghua
2. 清华大学北京市未来芯片技术高精尖创新中心
3. Beijing Advanced Innovation Center for Future Chip
4. ICFC

BibTeX

@article{Du_2020, title={Berry curvature engineering by gating two-dimensional antiferromagnets}, volume={2}, ISSN={2643-1564}, url={http://dx.doi.org/10.1103/physrevresearch.2.022025}, DOI={10.1103/physrevresearch.2.022025}, number={2}, journal={Physical Review Research}, publisher={American Physical Society (APS)}, author={Du, Shiqiao and Tang, Peizhe and Li, Jiaheng and Lin, Zuzhang and Xu, Yong and Duan, Wenhui and Rubio, Angel}, year={2020}, month=may }

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