Crossref journal-article
American Physical Society (APS)
Physical Review Letters (16)
Bibliography

Liu, X., Burton, J. D., & Tsymbal, E. Y. (2016). Enhanced Tunneling Electroresistance in Ferroelectric Tunnel Junctions due to the Reversible Metallization of the Barrier. Physical Review Letters, 116(19).

Dates
Type When
Created 9 years, 3 months ago (May 11, 2016, 6:08 p.m.)
Deposited 7 months, 3 weeks ago (Jan. 2, 2025, 6:33 p.m.)
Indexed 5 hours, 48 minutes ago (Aug. 23, 2025, 9:26 p.m.)
Issued 9 years, 3 months ago (May 11, 2016)
Published 9 years, 3 months ago (May 11, 2016)
Published Online 9 years, 3 months ago (May 11, 2016)
Funders 2
  1. National Science Foundation 10.13039/100000001

    Region: Americas

    gov (National government)

    Labels4
    1. U.S. National Science Foundation
    2. NSF
    3. US NSF
    4. USA NSF
    Awards1
    1. DMR-1420645
  2. CNFD

@article{Liu_2016, title={Enhanced Tunneling Electroresistance in Ferroelectric Tunnel Junctions due to the Reversible Metallization of the Barrier}, volume={116}, ISSN={1079-7114}, url={http://dx.doi.org/10.1103/physrevlett.116.197602}, DOI={10.1103/physrevlett.116.197602}, number={19}, journal={Physical Review Letters}, publisher={American Physical Society (APS)}, author={Liu, Xiaohui and Burton, J. D. and Tsymbal, Evgeny Y.}, year={2016}, month=may }